Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | MMP1 | P03956 | 1/20 | 0.45 |
| ▸ | MMP2 | P08253 | 1/20 | 0.45 |
| ▸ | MMP3 | P08254 | 1/20 | 0.45 |
| ▸ | MMP9 | P14780 | 1/20 | 0.45 |
| ▸ | MMP13 | P45452 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | TET2 | Q6N021 | 6/20 | 0.41 |
| ▸ | TET3 | O43151 | 2/20 | 0.41 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.35 |
| ▸ | KDM4A | O75164 | 2/20 | 0.34 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.34 |
| ▸ | KDM2A | Q9Y2K7 | 2/20 | 0.34 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16928435 | 0.83 | SMN1; SMN2 (0.44) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL18219230 | 0.83 | SMN1; SMN2 (0.44) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL1828782 | 0.82 | LMNA (0.41) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL2246742 | 0.82 | LMNA (0.41) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL918978 | 0.82 | LMNA (0.41) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL29929853 | 0.82 | LMNA (0.41) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL27784485 | 0.81 | MMP1 (0.48) | MMP1MMP2MMP3MMP9MMP13 | |
| SCHEMBL7770223 | 0.81 | OR51E2 (0.44) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL672779 | 0.80 | LMNA (0.39) | SMN1; SMN2MMP1MMP2MMP3MMP9 | |
| SCHEMBL672781 | 0.80 | LMNA (0.39) | SMN1; SMN2MMP1MMP2MMP3MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| EP-4357852-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | Resonac Corporation (JP) | 2024-04-24 | — | — | EP | disclosed |
| US-20230393476-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | RESONAC CORPORATION (JP) | 2023-12-07 | — | — | US | disclosed |
| US-20230145264-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING WIRING BOARD | RESONAC CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| US-11561469-B2 | Photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2023-01-24 | — | — | US | disclosed |
| CN-110012667-B | Crystalline hydrate | 葛兰素史克知识产权开发有限公司 | 2022-12-13 | — | — | CN | disclosed |
| US-20200033726-A1 | PHOTOSENSITIVE RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2020-01-30 | — | — | US | disclosed |
| US-10175577-B2 | Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-01-08 | — | — | US | disclosed |
| US-9439291-B2 | Photosensitive element, method for forming resist pattern, and method for producing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| EP-1916228-A1 | METHOD FOR PRODUCING SOLID ELECTROLYTE SHEET AND SOLID ELECTROLYTE SHEET | Nippon Shokubai Co.,Ltd. (JP) | 2008-04-30 | — | — | EP | disclosed |
| CN-101147285-A | Fuel electrode material for solid oxide fuel cell, fuel electrode using same, fuel-cell pack | NIPPON CATALYTIC CHEM IND (JP) | 2008-03-19 | — | — | CN | disclosed |
| US-20080033154-A1 | Process for Producing 3-Aminomethyltetrahydrofuran Derivative | MITSUI CHEMICALS, INC. (JP) | 2008-02-07 | — | — | US | disclosed |
| EP-1858098-A1 | ELCTROLYTE SHEET FOR SOLID OXIDE FUEL BATTERY, PROCESS FOR PRODUCING THE SAME, AND SOLID OXIDE FUEL BATTERY CELL | Nippon Shokubai Co.,Ltd. (JP) | 2007-11-21 | — | — | EP | disclosed |
| EP-1780205-A1 | METHOD FOR PRODUCING 3-AMINOMETHYLTETRAHYDROFURAN DERIVATIVE | Mitsui Chemicals, Inc. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-6902790-B1 | Ceramic sheet and process for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| EP-1063212-B1 | Ceramic sheet and process for producing the same | NIPPON CATALYTIC CHEM IND (JP) | 2004-10-06 | — | — | EP | disclosed |
| EP-1063212-A1 | Ceramic sheet and process for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2000-12-27 | — | — | EP | disclosed |
| US-4992544-A | Intermediates for b-lactam antibiotics and b-lactamase inhibitor | UNIVERSITY OF NOTRE DAME DU LAC (US) | 1991-02-12 | — | — | US | disclosed |
| US-4005189-A | Process of suppressing odors employing deodorants containing esters of aliphatic hydroxycarboxylic acids | HENKEL & CIE G.M.B.H. (DT) | 1977-01-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | SMN1; SMN2 1264/4885MMP1 4140/4885MMP2 4786/4885 |
| US-20080033154-A1 | Process for Producing 3-Aminomethyltetrahydrofuran Derivative | ALAD, ACMSD, HPD | SMN1; SMN2 3517/4885MMP1 3038/4885MMP2 1091/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.