SCHEMBL308702

SCHEMBL308702

Clc1ccc(C2=NC(c3ccccc3Cl)(n3c(-c4ccccc4Cl)nc(-c4ccc(Cl)cc4Cl)c3-c3ccc(Cl)cc3Cl)N=C2c2ccc(Cl)cc2Cl)c(Cl)c1

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
DPP4 P27487 5/20 0.37
DPP8 Q6V1X1 2/20 0.37
DPP9 Q86TI2 2/20 0.37
HSD11B1 P28845 4/20 0.36
KDM4E B2RXH2 4/20 0.36
MAPK1 P28482 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
ALDH1A1 P00352 1/20 0.34
GLA P06280 1/20 0.34
CNR1 P21554 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL308751 0.90 HSD11B1 (0.38) DPP4HSD11B1KDM4EMAPK1CNR1
SCHEMBL29895740 0.78 L3MBTL1 (0.43) KDM4EMAPK1MEN1KMT2AALDH1A1
SCHEMBL16355191 0.77 ALDH1A1 (0.41) DPP4HSD11B1KDM4EKMT2AALDH1A1
SCHEMBL29895743 0.77 L3MBTL1 (0.43) KDM4EMAPK1MEN1KMT2AALDH1A1
SCHEMBL29389827 0.76 HSD11B1 (0.42) DPP4HSD11B1KDM4EMAPK1ALDH1A1
SCHEMBL476565 0.76 HSD11B1 (0.42) DPP4HSD11B1KDM4EMAPK1ALDH1A1
SCHEMBL16355184 0.76 PIK3CD (0.36) DPP4KDM4E
SCHEMBL29749791 0.75 HSD11B1 (0.37) DPP4HSD11B1KDM4EKMT2AALDH1A1
SCHEMBL14178404 0.75 HSD11B1 (0.37) HSD11B1KDM4EKMT2AALDH1A1GLA
SCHEMBL29359500 0.75 HSD11B1 (0.37) DPP4HSD11B1KDM4EKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
EP-1866357-B1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2012-02-22 EP disclosed
US-8092982-B2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO., LTD. (KR) 2012-01-10 US disclosed
US-8044235-B2 (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof SHOWA DENKO K.K. (JP) 2011-10-25 US disclosed
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL SHOWA DENKO K.K. (JP) 2010-06-24 US disclosed
EP-2154162-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED PRODUCT Showa Denko K.K. (JP) 2010-02-17 EP disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
EP-2082994-A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs Samsung SDI Co., Ltd. (KR) 2009-07-29 EP disclosed
US-20090186187-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIBS PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIBS SAMSUNG SDI CO., LTD. (KR) 2009-07-23 US disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
US-20080238318-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-10-02 US disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed
US-20080026320-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-01-31 US disclosed
EP-1870771-A2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib Samsung SDI Co., Ltd. (KR) 2007-12-26 EP disclosed
US-20040157140-A1 Photosensitive coloring composition, color filter using the composition and method of producing the same SHOWA DENKO K.K. (JP) 2004-08-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 DPP4 3469/4885DPP8 3126/4885DPP9 2884/4885
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL UNC119, MLLT1, H1-0 DPP4 4827/4885DPP8 4726/4885DPP9 4840/4885
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use ACAD9, ELOVL6, ELOVL5 DPP4 4774/4885DPP8 4707/4885DPP9 4314/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.