SCHEMBL31040504

SCHEMBL31040504

CCOc1ccc([S+]2CCCC2)c2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.45
LMNA P02545 6/20 0.45
TSHR P16473 6/20 0.45
HTT P42858 4/20 0.45
MCOLN3 Q8TDD5 1/20 0.45
HPGD P15428 6/20 0.40
NPSR1 Q6W5P4 3/20 0.40
MAPT P10636 3/20 0.40
ALOX12 P18054 2/20 0.40
NTSR1 P30989 1/20 0.40
CCR6 P51684 1/20 0.40
MCL1 Q07820 1/20 0.40
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
SMN1; SMN2 Q16637 4/20 0.37
GAA P10253 2/20 0.37
KDM4E B2RXH2 1/20 0.37
RECQL P46063 1/20 0.37
HSD17B10 Q99714 3/20 0.36
PKM P14618 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL137461 1.00 ALDH1A1 (0.45) ALDH1A1LMNATSHRHTTMCOLN3
SCHEMBL9949594 0.94 ALDH1A1 (0.41) ALDH1A1LMNATSHRHTTMCOLN3
SCHEMBL3454520 0.92 CNR2 (0.42) ALDH1A1LMNATSHRHTTMCOLN3
SCHEMBL3871001 0.88 LMNA (0.36) ALDH1A1LMNATSHRHTTMCOLN3
SCHEMBL31040506 0.88 CNR1 (0.44) TSHRHTTMEN1KMT2ASMN1; SMN2
SCHEMBL702260 0.88 CNR1 (0.44) TSHRHTTMEN1KMT2ASMN1; SMN2
SCHEMBL3870771 0.87 CLCN2 (0.33) ALDH1A1LMNATSHRHTTMCOLN3
SCHEMBL106524 0.86 CNR1 (0.45) HTTMEN1KMT2AGAACNR2
SCHEMBL29429149 0.86 CNR1 (0.45) HTTMEN1KMT2AGAACNR2
Trifluoromethanesulfonic Acid SCHEMBL36662 0.86 TSHR (0.44) ALDH1A1LMNATSHRHTTMCOLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119330866-A A photoacid generator Photoresist composition comprising the same 湖北鼎龙控股股份有限公司 2025-01-21 CN disclosed
CN-118511127-A Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article JSR株式会社 2024-08-16 CN disclosed