Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29592477 | 1.00 | ADRA2B (0.33) | ADRA2BADRA2CALDH1A1GAASMN1; SMN2 | |
| SCHEMBL29592315 | 0.90 | IMPDH2 (0.38) | ADRA2BADRA2CALDH1A1SMN1; SMN2 | |
| SCHEMBL17063035 | 0.90 | IMPDH2 (0.38) | ADRA2BADRA2CALDH1A1SMN1; SMN2 | |
| SCHEMBL13588219 | 0.87 | CYP1A2 (0.52) | ADRA2BADRA2CALDH1A1GAASMN1; SMN2 | |
| SCHEMBL3113592 | 0.87 | ESR1 (0.46) | ALDH1A1GAASMN1; SMN2CYP3A4 | |
| SCHEMBL194724 | 0.86 | HTR1B (0.46) | ALDH1A1GAACYP2A6 | |
| SCHEMBL29790427 | 0.86 | HTR1B (0.46) | ALDH1A1GAACYP2A6 | |
| SCHEMBL13899918 | 0.84 | HPRT1 (0.52) | ALDH1A1CYP3A4CYP2A6 | |
| SCHEMBL15946487 | 0.82 | HIF1A (0.41) | ALDH1A1GAASMN1; SMN2CYP3A4 | |
| SCHEMBL13705989 | 0.82 | GABRA1 (0.36) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-20240402602-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-05 | — | — | US | disclosed |
| US-20240384056-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-11-21 | — | — | US | disclosed |
| US-12139567-B2 | Curable composition, cured product, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-11-12 | — | — | US | disclosed |
| US-12129335-B2 | Curable composition, cured product, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-10-29 | — | — | US | disclosed |
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240192593-A1 | PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240191003-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-11981794-B2 | Curable composition, cured product, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-14 | — | — | US | disclosed |
| EP-4317196-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-07 | — | — | EP | disclosed |
| US-7732645-B2 | Aromatic vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-08 | — | — | US | disclosed |
| EP-2161248-A1 | Aromatic vinyl ether compounds | Daicel Chemical Industries, Ltd. (JP) | 2010-03-10 | — | — | EP | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-7518021-B2 | Aromatic vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20090088592-A1 | AROMATIC VINYL ETHER COMPOUNDS | IWAHAMA TAKAHIRO | 2009-04-02 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20040181098-A1 | Aromatic vinyl ether compounds | EMORY UNIVERSITY | 2004-09-16 | — | — | US | disclosed |
| EP-1413568-A2 | Aromatic vinyl ether compounds | Daicel Chemical Industries, Ltd. (JP) | 2004-04-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12139567-B2 | Curable composition, cured product, and compound | CROCC, RCSD1, CRYZ | ADRA2B 3940/4885ADRA2C 3123/4885ALDH1A1 2462/4885 |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | CHRM1, CHRM2, PKN2 | ADRA2B 1110/4885ADRA2C 1450/4885ALDH1A1 3349/4885 |
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | C5, CFL1, C9 | ADRA2B 1646/4885ADRA2C 2030/4885ALDH1A1 1968/4885 |
| US-20040181098-A1 | Aromatic vinyl ether compounds | SUV39H2, SUV39H1, RAVER1 | ADRA2B 1927/4885ADRA2C 1071/4885ALDH1A1 282/4885 |
| US-20090088592-A1 | AROMATIC VINYL ETHER COMPOUNDS | SUV39H2, SUV39H1, RAVER1 | ADRA2B 1343/4885ADRA2C 767/4885ALDH1A1 494/4885 |
| US-20240402602-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | CHMP4B, PHOSPHO1, EXOSC9 | ADRA2B 4023/4885ADRA2C 4570/4885ALDH1A1 2515/4885 |
| US-20240384056-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | CHMP4B, PHOSPHO1, EXOSC9 | ADRA2B 4024/4885ADRA2C 4562/4885ALDH1A1 2498/4885 |
| US-20240192593-A1 | PHOTOSENSITIVE COMPOSITION | PPOX, ERCC1, ERCC5 | ADRA2B 4696/4885ADRA2C 4734/4885ALDH1A1 1414/4885 |
| US-12129335-B2 | Curable composition, cured product, and compound | CROCC, RCSD1, WDR5 | ADRA2B 3485/4885ADRA2C 2699/4885ALDH1A1 1884/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.