Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.88 |
| ▸ | CES2 | O00748 | 4/20 | 0.88 |
| ▸ | CES1 | P23141 | 3/20 | 0.88 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.66 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.66 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | PGR | P06401 | 1/20 | 0.47 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.47 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.47 |
| ▸ | HTR2A | P28223 | 1/20 | 0.47 |
| ▸ | HRH1 | P35367 | 1/20 | 0.47 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL27609009 | 0.94 | LMNA (0.84) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL4557692 | 0.94 | LMNA (0.91) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28120851 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL2025536 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL27696284 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL5833429 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL901258 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL145 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL10665271 | 0.94 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL337105 | 0.92 | LMNA (0.88) | LMNACES2CES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 846 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1646493-B1 | VISCOSITY REDUCIBLE RADIATION CURABLE RESIN COMPOSITION | DSM IP ASSETS BV (NL) | 2011-11-16 | — | — | EP | claimed |
| EP-1770119-B1 | Crosslinkabe elastomer compositions, process for preparation, and use thereof | LANXESS DEUTSCHLAND GMBH (DE) | 2009-11-25 | — | — | EP | claimed |
| WO-2009054621-A2 | THE COMPOSITION OF DECOLORABLE INK AND DECOLORING METHOD | HAN JONG-SOO (KR) | 2009-04-30 | — | — | WO | claimed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | claimed |
| US-6818375-B2 | FOR MANUFACTURING PRINTED WIRING BOARDS | ETERNAL TECHNOLOGY CORPORATION | 2004-11-16 | — | — | US | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| EP-0683174-B1 | Thioether containing photopolymerizable compositions | EASTMAN KODAK CO (US) | 1998-08-05 | — | — | EP | claimed |
| US-5532286-A | BONDING STRENGTH | EASTMAN KODAK COMPANY (US) | 1996-07-02 | — | — | US | claimed |
| EP-0683174-A2 | Thioether containing photopolymerizable compositions | EASTMAN KODAK COMPANY (US) | 1995-11-22 | — | — | EP | claimed |
| US-5085697-A | Applying photosensitive ink on substrate; curing | HAYAKAWA RUBBER CO., LTD. (JP) | 1992-02-04 | — | — | US | claimed |
| JP-61174255-A | — | — | None | — | — | JP | disclosed |
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| US-12631960-B2 | Photosensitive resin composition, photosensitive resin film using same, color filter, and display device | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| US-4118366-A | Compositions for the production of opaque coatings by radiation | BASF FARBEN & FASERN AG (DE) | 1978-10-03 | — | — | US | disclosed |
| US-3997345-A | Process for preparing image plates with continuous gradation | NIPPON PAINT CO., LTD. (JA) | 1976-12-14 | — | — | US | disclosed |
| US-3993663-A | POLYCYCLOACETAL, ESTER, ALCOHOL | SHOWA HIGH POLYMER CO., LTD. (JA) | 1976-11-23 | — | — | US | disclosed |
| US-3984584-A | Opaque coatings and films produced by the hardening of synthetic resins with light | BASF FARBEN & FASERN AKTIENGESELLSCHAFT | 1976-10-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | LMNA 3372/4885CES2 385/4885CES1 1207/4885 |
| US-12631960-B2 | Photosensitive resin composition, photosensitive resin film using same, color filter, and display device | TAS1R1, TAS1R2, TAS1R3 | LMNA 2916/4885CES2 1442/4885CES1 1784/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.