Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1686196 | 0.97 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL319959 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Hydrochloric Acid SCHEMBL2581079 | 0.93 | KDM4E (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL10002125 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL2032857 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL1686254 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL476985 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL28465064 | 0.88 | SLC22A1 (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL10002123 | 0.88 | DNM1 (0.50) | TSHRCYP3A4DNM1SLC22A1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL715477 | 0.87 | KDM4E (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-12 | — | — | US | claimed |
| CN-118092091-A | Reducing chip photoresist stripping liquid, preparation method and application thereof | 浙江奥首材料科技有限公司 | 2024-05-28 | — | — | CN | claimed |
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-12 | — | — | US | disclosed |
| US-20250154410-A1 | COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND ETCHING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-05-15 | — | — | US | disclosed |
| WO-2025063222-A1 | COMPOSITION AND KIT, AND METHOD FOR REMOVING RESIST AND METHOD FOR MANUFACTURING ELECTRONIC SUBSTRATE EACH USING THESE | 三菱瓦斯化学株式会社 | 2025-03-27 | — | — | WO | disclosed |
| CN-112534351-B | Photosensitive resin composition and method for forming resist pattern | 旭化成株式会社 | 2025-03-18 | — | — | CN | disclosed |
| EP-4485506-A1 | COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND ETCHING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-01-01 | — | — | EP | disclosed |
| CN-118778362-A | Photosensitive resin composition and method for forming resist pattern | 旭化成株式会社 | 2024-10-15 | — | — | CN | disclosed |
| CN-118715596-A | Composition, and method for manufacturing and etching semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2024-09-27 | — | — | CN | disclosed |
| WO-2024171908-A1 | SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD | 東京エレクトロン株式会社 | 2024-08-22 | — | — | WO | disclosed |
| CN-118369621-A | Method for stripping resin mask | 花王株式会社 | 2024-07-19 | — | — | CN | disclosed |
| US-20020016272-A1 | Cleaning agent for a semi-conductor substrate | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-6310019-B1 | COMPRISING NONIONIC SURFACTANT; FOR CLEANING SURFACE HAVING COPPER WIRINGS; CORROSION RESISTANCE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-20010003481-A1 | Process and equipment for recovering developer from photoresist development waste and reusing it | SUGAWARA HIROSHI (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6187519-B1 | TETRAALKYLAMMONIUM HYDROXIDE (TAAH) SOLUTION IS MIXED WITH A SURFACE-ACTIVE SUBSTANCE TO HAVE THE SURFACE TENSION THEREOF ADJUSTED TO A DESIRED ONE, AND THEN REUSED AS A REJUVENATED DEVELOPER. | ORGANO CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6083670-A | MAINLY CONTAINING A PHOTORESIST AND TETRAALKYLAMMONIUM IONS, NANOFILTRATION MEMBRANE | ORGANO CORPORATION (JP) | 2000-07-04 | — | — | US | disclosed |
| US-5874204-A | ELECTROLYSIS OR ELECTRODIALYSIS AND ION EXCHANGING | ORGANO CORPORATION (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0056145-B1 | PROCESS FOR THE PRODUCTION OF INORGANIC-ORGANIC FOAMS | Mobay Chemical Corporation (US) | 1985-06-12 | — | — | EP | disclosed |
| US-4355118-A | POLYISOCYANATE, ALKALIMETAL SILICATE, ONIUM COMPOUND | MOBAY CHEMICAL CORPORATION (US) | 1982-10-19 | — | — | US | disclosed |
| EP-0056145-A1 | Process for the production of inorganic-organic foams | Mobay Chemical Corporation (US) | 1982-07-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | ACP1, PLOD1, CA1 | TSHR 2833/4885NFKB1 3415/4885KCNA1 2916/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.