SCHEMBL3203466

SCHEMBL3203466

CC(C)(C)Oc1cccc(OC(C)(C)C)c1S(OS(=O)(=O)c1c(F)cccc1F)(c1ccccc1)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 2/20 0.34
PKM P14618 2/20 0.33
HSD11B1 P28845 2/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
KMT2A Q03164 2/20 0.31
LMNA P02545 1/20 0.31
MEN1 O00255 1/20 0.31
KAT6A Q92794 1/20 0.30
ALDH1A1 P00352 2/20 0.30
PKLR P30613 1/20 0.30
GAA P10253 1/20 0.30
HTT P42858 1/20 0.30
PTGES2 Q9H7Z7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3192420 0.90 PKM (0.31) PKMNPC1KMT2ALMNAMEN1
SCHEMBL3181637 0.90 HTR6 (0.34) HTR6HSD11B1KAT6AALDH1A1
SCHEMBL3197754 0.87 KMT2A (0.37) HTR6PKMHSD11B1NPC1POLB
SCHEMBL3191828 0.86 HTR6 (0.33) HTR6HSD11B1ALDH1A1
SCHEMBL3200901 0.85 ABCC9 (0.34) HTR6PKMKMT2AMEN1ALDH1A1
SCHEMBL3193905 0.83 PKM (0.32) PKMKMT2AALDH1A1PKLRGAA
SCHEMBL3190292 0.83 KMT2A (0.37) PKMKMT2ALMNAMEN1KAT6A
SCHEMBL3195455 0.82 LMNA (0.33) PKMHSD11B1KMT2ALMNAKAT6A
SCHEMBL3193377 0.81 HSD11B1 (0.40) HSD11B1KMT2AMEN1ALDH1A1PTGES2
SCHEMBL3183484 0.81 ALDH1A1 (0.34) HTR6HSD11B1KMT2ALMNAKAT6A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed