SCHEMBL3228663

SCHEMBL3228663

CCC(C)CC(CC)C(O)O

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.40
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7156294 0.80 TSHR (0.42) TSHRLMNA
SCHEMBL4891095 0.77 TSHR (0.41) TSHRLMNA
SCHEMBL4885114 0.77 TSHR (0.35) TSHRLMNA
SCHEMBL9764131 0.77 TSHR (0.30) TSHR
SCHEMBL320579 0.75
SCHEMBL23923255 0.74 TSHR (0.42) TSHR
SCHEMBL27757358 0.74 TSHR (0.35) TSHRLMNA
SCHEMBL3897308 0.74
SCHEMBL4889488 0.74 LMNA (0.39) TSHRLMNA
SCHEMBL4889381 0.73 TSHR (0.47) TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260132258-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR MANUFACTURING ARTICLE, AND ARTICLE AGC Inc. (JP) 2026-05-14 US disclosed
US-20260132259-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-05-14 US disclosed
US-20260132155-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-05-14 US disclosed
US-20260132295-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR MANUFACTURING ARTICLE, AND ARTICLE AGC Inc. (JP) 2026-05-14 US disclosed
US-20260125403-A1 COMPOUND, METHOD FOR MANUFACTURING COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-05-07 US disclosed
US-20260125579-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-05-07 US disclosed
US-20260117092-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-04-30 US disclosed
US-20260022257-A1 COMPOUND, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE AGC Inc. (JP) 2026-01-22 US disclosed
EP-4682222-A1 THERMALLY CONDUCTIVE GREASE COMPOSITION Cosmo Oil Lubricants Co., Ltd. (JP) 2026-01-21 EP disclosed
EP-4682221-A1 THERMALLY CONDUCTIVE GREASE COMPOSITION Cosmo Oil Lubricants Co., Ltd. (JP) 2026-01-21 EP disclosed
EP-1484756-B1 OPTICAL INFORMATION MEDIUM TDK CORP (JP) 2006-10-18 EP disclosed
US-20060167200-A1 Active energy ray curable composition for coating optical disk and optical disk MITSUBISHI RAYON CO., LIMITED (JP) 2006-07-27 US disclosed
US-20060166140-A1 Active energy ray curable composition for coating optical disk and optical disk MITSUBISHI RAYON CO., LIMITED (JP) 2006-07-27 US disclosed
US-20050118380-A1 optical recording media comprising support substrates having data recording surfaces and light transmission layer having excellent transparency, wear resistance and recording film protective ability, used for high density recording using blue lasers MITSUBISHI RAYON CO., LTD. (JP) 2005-06-02 US disclosed
EP-1484756-A1 OPTICAL INFORMATION MEDIUM TDK Corporation (JP) 2004-12-08 EP disclosed
US-20040013976-A1 Active energy ray curable composition for coating optical disk and optical disk MITSUBISHI CHEMICAL CORPORATION (JP) 2004-01-22 US disclosed
EP-1350816-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION FOR COATING OPTICAL DISK AND OPTICAL DISK Mitsubishi Rayon Co., Ltd. (JP) 2003-10-08 EP disclosed
US-20030054103-A1 Curable coating composition, curable ink, printing method thereof and printed matter TOYO INK MFG. CO., LTD. (JP) 2003-03-20 US disclosed
US-5110954-A Catalytic conversion to lactone E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-05-05 US disclosed
WO-1992000973-A1 DEHYDROGENATION OF DIOLS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-01-23 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260132295-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR MANUFACTURING ARTICLE, AND ARTICLE MSR1, SEM1, ASH2L TSHR 1475/4885LMNA 211/4885
US-20260022257-A1 COMPOUND, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE GFRA1, FLI1, FPR1 TSHR 1041/4885LMNA 1424/4885
US-20260125579-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE AND METHOD FOR MANUFACTURING ARTICLE SEM1, MSR1, ITGA1 TSHR 2369/4885LMNA 253/4885
US-20260117092-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE MSR1, TLL1, RPS4X TSHR 1848/4885LMNA 279/4885
US-20260132259-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE MSR1, SEM1, TAS2R1 TSHR 1004/4885LMNA 402/4885
US-20260132258-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR MANUFACTURING ARTICLE, AND ARTICLE SEM1, PSMA1, CSNK1A1L TSHR 2137/4885LMNA 816/4885
US-20260132155-A1 COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE MSR1, SRRM2, MRGPRX2 TSHR 230/4885LMNA 456/4885
US-20260125403-A1 COMPOUND, METHOD FOR MANUFACTURING COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, ARTICLE, AND METHOD FOR MANUFACTURING ARTICLE MRE11, C9, MSR1 TSHR 2715/4885LMNA 484/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.