SCHEMBL3278596

SCHEMBL3278596

O=[N+]([O-])c1ccc(S(=O)(=O)ON=[C]c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 5/20 0.44
▸ CA12 O43570 4/20 0.44
▸ CA9 Q16790 4/20 0.44
▸ ALDH1A1 P00352 6/20 0.44
▸ MAPT P10636 3/20 0.44
▸ LMNA P02545 3/20 0.43
▸ MEN1 O00255 4/20 0.42
▸ KMT2A Q03164 4/20 0.42
▸ SMN1; SMN2 Q16637 2/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ HSP90AA1 P07900 1/20 0.41
▸ OPRK1 P41145 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ HTT P42858 1/20 0.41
▸ CA1 P00915 4/20 0.41
▸ CA14 Q9ULX7 3/20 0.41
▸ CA3 P07451 2/20 0.41
▸ CA4 P22748 2/20 0.41
▸ CA6 P23280 2/20 0.41
▸ CA5A P35218 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3278594 1.00 CA2 (0.44) CA2CA12CA9ALDH1A1MAPT
SCHEMBL3281140 0.80 TDP1 (0.47) CA2CA12CA9ALDH1A1MAPT
SCHEMBL3279903 0.80 MEN1 (0.46) CA2CA12CA9ALDH1A1MAPT
SCHEMBL10643770 0.80 ESR1 (0.40) CA2CA12CA9ALDH1A1MAPT
SCHEMBL3281138 0.80 TDP1 (0.47) CA2CA12CA9ALDH1A1MAPT
SCHEMBL3279910 0.80 MEN1 (0.46) CA2CA12CA9ALDH1A1MAPT
SCHEMBL3279294 0.78 ALDH1A1 (0.42) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL3279299 0.78 ALDH1A1 (0.42) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL3279887 0.74 TDP1 (0.51) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL3279882 0.74 TDP1 (0.51) ALDH1A1MAPTLMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A CA2 1042/4885CA12 532/4885CA9 429/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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