SCHEMBL3280063

SCHEMBL3280063

COc1ccc([C]=NOS(=O)(=O)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.43
▸ EP300 Q09472 1/20 0.43
▸ KAT2A Q92830 1/20 0.43
▸ KAT2B Q92831 1/20 0.43
▸ TDP1 Q9NUW8 3/20 0.43
▸ HTT P42858 2/20 0.43
▸ L3MBTL1 Q9Y468 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.43
▸ GAA P10253 1/20 0.43
▸ HSP90AA1 P07900 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ XBP1 P17861 1/20 0.42
▸ MPI P34949 1/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ HSD11B1 P28845 1/20 0.41
▸ PKM P14618 1/20 0.41
▸ TUBB4A P04350 1/20 0.40
▸ TUBB P07437 1/20 0.40
▸ TUBA3C P0DPH7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3280059 1.00 ALDH1A1 (0.43) ALDH1A1EP300KAT2AKAT2BTDP1
SCHEMBL3279887 0.81 TDP1 (0.51) ALDH1A1TDP1HTTLMNAGAA
SCHEMBL3279882 0.81 TDP1 (0.51) ALDH1A1TDP1HTTLMNAGAA
SCHEMBL3287125 0.80 NFE2L2 (0.40) ALDH1A1TDP1HTTL3MBTL1LMNA
SCHEMBL3287120 0.80 NFE2L2 (0.40) ALDH1A1TDP1HTTL3MBTL1LMNA
SCHEMBL28313062 0.79 PKM (0.42) EP300KAT2AKAT2BLMNAGAA
SCHEMBL3279903 0.78 MEN1 (0.46) ALDH1A1TDP1HTTL3MBTL1LMNA
SCHEMBL3279910 0.78 MEN1 (0.46) ALDH1A1TDP1HTTL3MBTL1LMNA
SCHEMBL3281138 0.75 TDP1 (0.47) ALDH1A1TDP1L3MBTL1SMN1; SMN2GAA
SCHEMBL3281140 0.75 TDP1 (0.47) ALDH1A1TDP1L3MBTL1SMN1; SMN2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A ALDH1A1 56/4885EP300 856/4885KAT2A 996/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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