Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.39 |
| ▸ | PDE7A | Q13946 | 1/20 | 0.33 |
| ▸ | PDE7B | Q9NP56 | 1/20 | 0.33 |
| ▸ | DHFR | P00374 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8412982 | 0.84 | NPC1 (0.38) | — | |
| SCHEMBL2832962 | 0.81 | TP53 (0.43) | — | |
| SCHEMBL765590 | 0.81 | ADORA3 (0.38) | PDE7APDE7B | |
| SCHEMBL13528466 | 0.81 | DHFR (0.37) | DHFR | |
| SCHEMBL3343534 | 0.80 | TP53 (0.42) | — | |
| SCHEMBL5019508 | 0.80 | MKNK1 (0.40) | PDE7APDE7B | |
| SCHEMBL17756343 | 0.80 | IDO1 (0.46) | IDO1DHFR | |
| SCHEMBL14040238 | 0.79 | S1PR1 (0.39) | — | |
| SCHEMBL3311317 | 0.79 | L3MBTL1 (0.42) | PDE7APDE7B | |
| SCHEMBL80044 | 0.76 | NPC1 (0.52) | DHFR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9926422-B2 | Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170260348-A1 | BUMP-FORMING MATERIAL, METHOD FOR PRODUCING ELECTRONIC COMPONENT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2017-09-14 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-8088552-B2 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110318689-A1 | LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110318689-A1 | LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20100112478-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2010-05-06 | — | — | US | disclosed |
| US-7704675-B2 | Photosensitive recording layer of sensityzing dye, polymerization initiator, polymerizable compound, binder polymer, protective oxygen barrier layer; backcoat layer of epoxy resin; infrared absorber; scratches prevented without interleaving slip sheets | FUJIFILM CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20100081090-A1 | PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20090208870-A1 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO.,LTD. | 2009-08-20 | — | — | US | disclosed |
| EP-1520695-B1 | Photosensitive composition and image recording material using the same | FUJIFILM CORP (JP) | 2008-12-10 | — | — | EP | disclosed |
| EP-1518673-B1 | Photosensitive composition and planographic printing plate precursor | FUJIFILM CORP (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-20080113296-A1 | Photosensitive recording layer of sensityzing dye, polymerization initiator, polymerizable compound, binder polymer, protective oxygen barrier layer; backcoat layer of epoxy resin; infrared absorber; scratches prevented without interleaving slip sheets | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |