Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.41 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.38 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.38 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.38 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.38 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.38 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.38 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.38 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4378408 | 0.82 | SMN1; SMN2 (0.43) | MAPTKDM4EALDH1A1HPGDLMNA | |
| SCHEMBL797850 | 0.82 | CA2 (0.43) | ALDH1A1KEAP1NFE2L2CA12CA1 | |
| SCHEMBL3348892 | 0.82 | KEAP1 (0.54) | ALDH1A1KEAP1NFE2L2SMN1; SMN2CA12 | |
| SCHEMBL196635 | 0.81 | KMT2A (0.49) | KDM4EALDH1A1HTTSMN1; SMN2CA12 | |
| SCHEMBL14364107 | 0.80 | SLC6A9 (0.40) | KDM4EALDH1A1KEAP1NFE2L2SMN1; SMN2 | |
| SCHEMBL9632043 | 0.80 | TPMT (0.40) | ALDH1A1KEAP1NFE2L2CA12CA1 | |
| SCHEMBL5726224 | 0.80 | TDP1 (0.46) | MAPTKDM4EALDH1A1KEAP1NFE2L2 | |
| SCHEMBL10906215 | 0.80 | ALDH1A1 (0.57) | MAPTALDH1A1HPGDLMNACA12 | |
| SCHEMBL8541381 | 0.80 | ALDH1A1 (0.45) | MAPTKDM4EALDH1A1HPGDKEAP1 | |
| Hydrochloric Acid SCHEMBL1961276 | 0.80 | CA2 (0.42) | ALDH1A1KEAP1NFE2L2CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114644836-A | Carboxylate two-photon dye taking fluorene ring as matrix, and synthesis method and application thereof | 浙江大学 | 2022-06-21 | — | — | CN | claimed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119264419-A | Clustering peptide with side group containing functionalized diphenylamine group and preparation method thereof | 华东理工大学 | 2025-01-07 | — | — | CN | disclosed |
| CN-118159908-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| CN-114644836-B | Carboxylate two-photon dye taking fluorene ring as matrix, synthetic method and application | 浙江大学 | 2023-05-12 | — | — | CN | disclosed |
| WO-2023074325-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2023-05-04 | — | — | WO | disclosed |
| CN-114644836-A | Carboxylate two-photon dye taking fluorene ring as matrix, and synthesis method and application thereof | 浙江大学 | 2022-06-21 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| EP-2172806-A2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | Hitachi Chemical Company, Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-5472823-A | Polyamic acids | HITACHI CHEMICAL CO., LTD. (JP) | 1995-12-05 | — | — | US | disclosed |
| EP-0373952-B1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL CO LTD (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |