SCHEMBL9632043

SCHEMBL9632043

CN(CC(=O)O)c1ccc(I)cc1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TPMT P51580 1/20 0.40
APP P05067 3/20 0.39
CA12 O43570 3/20 0.38
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA9 Q16790 3/20 0.38
KEAP1 Q14145 1/20 0.38
NFE2L2 Q16236 1/20 0.38
ALDH1A1 P00352 1/20 0.36
GAA P10253 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
NLRP3 Q96P20 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3348892 0.82 KEAP1 (0.54) CA12CA1CA2CA9KEAP1
SCHEMBL797850 0.82 CA2 (0.43) APPCA12CA1CA2CA9
SCHEMBL196635 0.81 KMT2A (0.49) CA12CA2CA9ALDH1A1MEN1
SCHEMBL14364107 0.80 SLC6A9 (0.40) APPCA12CA1CA2CA9
SCHEMBL10906215 0.80 ALDH1A1 (0.57) CA12CA1CA2CA9ALDH1A1
Hydrochloric Acid SCHEMBL1961276 0.80 CA2 (0.42) APPCA12CA1CA2CA9
SCHEMBL3349309 0.80 MAPT (0.41) CA12CA1CA2CA9KEAP1
SCHEMBL8541381 0.80 ALDH1A1 (0.45) KEAP1NFE2L2ALDH1A1L3MBTL1
SCHEMBL5726224 0.80 TDP1 (0.46) CA12CA1CA2CA9KEAP1
SCHEMBL3763384 0.80 NPC1 (0.50) TPMTCA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
CN-120077329-A Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern 旭化成株式会社 2025-05-30 CN disclosed
CN-118159908-A Photosensitive element and method for forming resist pattern 旭化成株式会社 2024-06-07 CN disclosed
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
WO-2023074325-A1 PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2023-05-04 WO disclosed
EP-2951173-B1 NOVEL SUBSTITUTED CONDENSED PYRIMIDINE COMPOUNDS GRUENENTHAL GMBH (DE) 2017-05-17 EP disclosed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed