Water

Water

SCHEMBL339458

O.[GaH3].[LiH].[LiH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL137758 1.00
Water SCHEMBL2865855 0.87
Water SCHEMBL27872666 0.87
Iodide SCHEMBL28968053 0.87
Water SCHEMBL11766081 0.82
Water SCHEMBL502821 0.82
Water SCHEMBL11848168 0.82
Water SCHEMBL20969033 0.82
Water SCHEMBL5822 0.82
Water SCHEMBL15416076 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103646857-B Semiconductor structure and forming method thereof 清华大学 2016-08-17 CN claimed
CN-104205370-B Optical substrate, semiconductor light-emitting element, and method for producing semiconductor light-emitting element 旭化成株式会社 2017-03-22 CN disclosed
CN-103748699-B Optical substrate and semiconductor light-emitting elements 旭化成株式会社 2017-03-15 CN disclosed
CN-106460228-A Process for producing group iii nitride crystal and apparatus for producing group iii nitride crystal 国立大学法人大阪大学 2017-02-22 CN disclosed
CN-103548124-B The method of the III nitride semiconductor growth improved 应用材料公司 2016-10-26 CN disclosed
CN-103548117-B The method of the group III-nitride buffer growth improved 应用材料公司 2016-10-05 CN disclosed
CN-103646857-B Semiconductor structure and forming method thereof 清华大学 2016-08-17 CN disclosed
CN-103296154-B The manufacture method of III group-III nitride semiconductor light-emitting component, III group-III nitride semiconductor light-emitting component, lamp and reticle mask 丰田合成株式会社 2016-08-03 CN disclosed
CN-102386201-B Light emitting device and method for manufacturing the same 晶元光电股份有限公司 2016-07-06 CN disclosed
US-8765507-B2 Method for manufacturing group III nitride semiconductor, method for manufacturing group III nitride semiconductor light-emitting device, group III nitride semiconductor light-emitting device, and lamp TOYODA GOSEI CO., LTD. (JP) 2014-07-01 US disclosed
US-20110284919-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LAYER, METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2011-11-24 US disclosed
US-20110163350-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LAYER, METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2011-07-07 US disclosed
US-20110101391-A1 GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND LAMP SHOWA DENKO K.K. 2011-05-05 US disclosed
EP-2273536-A1 GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND LAMP Showa Denko K.K. (JP) 2011-01-12 EP disclosed
US-20100301379-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR, METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP TOYODA GOSEI CO., LTD. (JP) 2010-12-02 US disclosed
US-20100244086-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR, METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2010-09-30 US disclosed
US-20100051980-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE, GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2010-03-04 US disclosed
US-20100025684-A1 METHOD FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR LAYER, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2010-02-04 US disclosed
US-7585690-B2 Process for producing group III nitride compound semiconductor light emitting device, group III nitride compound semiconductor light emitting device and lamp SHOWA DENKO K.K. (JP) 2009-09-08 US disclosed
US-20080116478-A1 PROCESS FOR PRODUCING III GROUP NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE, III GROUP NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE AND LAMP SHOWA DENKO K.K. (JP) 2008-05-22 US disclosed