SCHEMBL3406771

SCHEMBL3406771

CCCCCCCCCC(Oc1ccccc1)=C(C)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.47
FNTA P49354 1/20 0.47
FNTB P49356 1/20 0.47
PGGT1B P53609 1/20 0.47
ZDHHC2 Q9UIJ5 1/20 0.47
CES2 O00748 2/20 0.46
CES1 P23141 2/20 0.46
FAAH O00519 6/20 0.46
PTGS2 P35354 1/20 0.44
EPHX2 P34913 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7217885 1.00 THRB (0.47) THRBFNTAFNTBPGGT1BZDHHC2
SCHEMBL578949 1.00 THRB (0.47) THRBFNTAFNTBPGGT1BZDHHC2
SCHEMBL15648200 0.94 MEN1 (0.44) THRBFNTAFNTBPGGT1BZDHHC2
SCHEMBL7520648 0.87 CES2 (0.41) THRBZDHHC2CES2CES1FAAH
SCHEMBL7520639 0.87 CES2 (0.41) THRBZDHHC2CES2CES1FAAH
SCHEMBL6683174 0.84 ESRRB (0.39) TDP1MEN1KMT2A
SCHEMBL28736630 0.84 ZDHHC2 (0.46) THRBFNTAFNTBPGGT1BZDHHC2
SCHEMBL372286 0.84 ZDHHC2 (0.46) THRBFNTAFNTBPGGT1BZDHHC2
SCHEMBL10627272 0.81 ZDHHC2 (0.47) ZDHHC2CES2CES1FAAHEPHX2
SCHEMBL372285 0.81 THRB (0.46) THRBFNTAFNTBPGGT1BZDHHC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9588424-B2 Photosensitive resin composition for screen printing, photosensitive film, and screen plate SUNTYPE CO., LTD. (JP) 2017-03-07 US disclosed
US-20150212413-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PRINTING, PHOTOSENSITIVE FILM, AND SCREEN PLATE SUNTYPE CO., LTD. (JP) 2015-07-30 US disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL SHOWA DENKO K.K. (JP) 2010-06-24 US disclosed
US-7622613-B2 Thiol compound and photosensitive composition using the same SHOWA DENKO K.K. (JP) 2009-11-24 US disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
US-20080139688-A1 Thiol Compound And Photosensitive Composition Using The Same SHOWA DENKO K.K. (JP) 2008-06-12 US disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed
US-20070218305-A1 Photosensitive Resin Composition, Cured Product Thereof and Production Method of Printed Circuit Board Using the Same SHOWA DENKO K.K. (JP) 2007-09-20 US disclosed
US-7232876-B2 Phosphorus-containing urethane(meth)acrylate compounds and photosensitive compositions SHOWA DENKO K.K. (JP) 2007-06-19 US disclosed
WO-2006046733-A1 THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND SHOWA DENKO K.K (JP) 2006-05-04 WO disclosed
US-20050107556-A1 Phosphorus-containing urethane(meth)acrylate compounds and photosensitive compositions SHOWA DENKO K.K. (JP) 2005-05-19 US disclosed
EP-1468033-A1 PHOSPHORUS-CONTAINING URETHANE (METH)ACRYLATE COMPOUNDS AND PHOTOSENSITIVE COMPOSITIONS Showa Denko K.K. (JP) 2004-10-20 EP disclosed
WO-2003062296-A1 PHOSPHORUS-CONTAINING URETHANE (METH)ACRYLATE COMPOUNDS AND PHOTOSENSITIVE COMPOSITIONS SHOWA DENKO K. K. (JP) 2003-07-31 WO disclosed
EP-0413863-A1 Image-forming process and image-forming material TOYO INK MANUFACTURING CO., LTD. (JP) 1991-02-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080139688-A1 Thiol Compound And Photosensitive Composition Using The Same TST, TMT1A, CRY1 THRB 2945/4885FNTA 2719/4885FNTB 3374/4885
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL UNC119, MLLT1, H1-0 THRB 3638/4885FNTA 3260/4885FNTB 2872/4885
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use ACAD9, ELOVL6, ELOVL5 THRB 4474/4885FNTA 951/4885FNTB 1393/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.