SCHEMBL3441203

SCHEMBL3441203

COC(=O)C(C)(C)OC=O

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.43
DGAT1 O75907 1/20 0.39
TP53 P04637 1/20 0.33
RAB9A P51151 1/20 0.33
LMNA P02545 2/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KEAP1 Q14145 1/20 0.32
NFE2L2 Q16236 1/20 0.32
HCAR2 Q8TDS4 1/20 0.32
KCNN4 O15554 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23336295 0.78 TDP1 (0.48) TDP1DGAT1
SCHEMBL3441115 0.76
SCHEMBL3441160 0.75 TDP1 (0.39) TDP1
SCHEMBL10012721 0.75 TDP1 (0.39) TDP1
SCHEMBL3441150 0.75 PKM (0.46) TDP1LMNAKMT2AALDH1A1
SCHEMBL194990 0.73
SCHEMBL9049471 0.73 DGAT1 (0.46) DGAT1TP53RAB9ALMNAKMT2A
SCHEMBL20519545 0.72
SCHEMBL19364604 0.72 DGAT1 (0.33) DGAT1
SCHEMBL23336332 0.72 TDP1 (0.36) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008354-A1 RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME 三菱瓦斯化学株式会社 2023-02-02 WO claimed
WO-2023008355-A1 RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAID COMPOSITION 三菱瓦斯化学株式会社 2023-02-02 WO claimed
WO-2023008356-A1 THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES USING SAID THINNER COMPOSITION 三菱瓦斯化学株式会社 2023-02-02 WO claimed
US-12624309-B2 Enol ether properfume FIRMENICH SA (CH) 2026-05-12 US disclosed
CN-112352037-B Isobutyrate compound having formyloxy group at alpha position, perfume composition and use as perfume 三菱瓦斯化学株式会社 2024-05-17 CN disclosed
CN-117769684-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2024-03-26 CN disclosed
CN-117716297-A Diluent composition and method for manufacturing semiconductor device using the same 三菱瓦斯化学株式会社 2024-03-15 CN disclosed
CN-117716290-A Resist composition and method for forming resist film using the same 三菱瓦斯化学株式会社 2024-03-15 CN disclosed
EP-4139274-B1 ENOL ETHER PROPERFUME FIRMENICH & CIE (CH) 2024-02-14 EP disclosed
US-20230220298-A1 ENOL ETHER PROPERFUME FIRMENICH & CIE (CH) 2023-07-13 US disclosed
EP-4139274-A1 ENOL ETHER PROPERFUME Firmenich SA (CH) 2023-03-01 EP disclosed
EP-2251926-B1 NON-AQUEOUS ELECTROLYTE FOR A LITHIUM BATTERY, LITHIUM BATTERY USING SAID ELECTROLYTE, AND HYDROXY-ACID DERIVATIVE FOR USE IN SAID ELECTROLYTE UBE INDUSTRIES (JP) 2013-09-11 EP disclosed
EP-2479831-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME Ube Industries, Ltd. (JP) 2012-07-25 EP disclosed
US-20120171581-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME UBE INDUSTRIES, LTD. (JP) 2012-07-05 US disclosed
US-20110064998-A1 NON-AQUEOUS ELECTROLYTE FOR A LITHIUM BATTERY, LITHIUM BATTERY WHEREIN SAID ELECTROLYTE IS USED, AND HYDROXY-ACID DERIVATIVE FOR USE IN SAID ELECTROLYTE UBE INDUSTRIES, LTD. (JP) 2011-03-17 US disclosed
EP-2251926-A1 NON-AQUEOUS ELECTROLYTE FOR A LITHIUM BATTERY, LITHIUM BATTERY WHEREIN SAID ELECTROLYTE IS USED, AND HYDROXY-ACID DERIVATIVE FOR USE IN SAID ELECTROLYTE Ube Industries, Ltd. (JP) 2010-11-17 EP disclosed
US-20030216258-A1 Condensed heterocylic compounds and herbicides containing them as active ingredients SUMITOMO CHEMICAL COMPANY, LIMITED 2003-11-20 US disclosed
US-6586368-B1 Benzofuran derivatives SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-07-01 US disclosed
EP-1112268-A1 CONDENSED HETEROCYCLIC COMPOUNDS AND HERBICIDES CONTAINING THEM SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2001-07-04 EP disclosed
WO-2000015633-A1 CONDENSED HETEROCYLIC COMPOUNDS AND HERBICIDES CONTAINING THEM SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-03-23 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230220298-A1 ENOL ETHER PROPERFUME CYP2E1, ADH5, ECI1 TDP1 3413/4885DGAT1 539/4885TP53 2780/4885
US-20030216258-A1 Condensed heterocylic compounds and herbicides containing them as active ingredients CBR3, CBR1, HAAO TDP1 1151/4885DGAT1 1300/4885TP53 2347/4885
US-20120171581-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME SLC8A1, OR10J3, SLC8B1 TDP1 4475/4885DGAT1 1650/4885TP53 4285/4885
US-12624309-B2 Enol ether properfume CYP2E1, CBR1, ADH5 TDP1 3468/4885DGAT1 326/4885TP53 3419/4885
US-20110064998-A1 NON-AQUEOUS ELECTROLYTE FOR A LITHIUM BATTERY, LITHIUM BATTERY WHEREIN SAID ELECTROLYTE IS USED, AND HYDROXY-ACID DERIVATIVE FOR USE IN SAID ELECTROLYTE HCN2, SLC9A1, SLC9B2 TDP1 2273/4885DGAT1 3352/4885TP53 3683/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.