Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CXCR3 | P49682 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | F2 | P00734 | 2/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.35 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.35 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.31 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25689888 | 0.90 | KMT2A (0.34) | CXCR3KMT2AF2PRSS1PRSS2 | |
| SCHEMBL24609557 | 0.84 | SMN1; SMN2 (0.36) | CXCR3SMN1; SMN2 | |
| SCHEMBL12888600 | 0.82 | CXCR3 (0.38) | CXCR3KMT2AF2PRSS1PRSS2 | |
| SCHEMBL14228117 | 0.80 | KMT2A (0.40) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL13763160 | 0.80 | CXCR3 (0.37) | CXCR3KMT2AF2PRSS1PRSS2 | |
| SCHEMBL13890600 | 0.79 | GRIN1 (0.32) | F2PRSS1PRSS2PRSS3GRIN1 | |
| SCHEMBL27725317 | 0.77 | CYP2C19 (0.40) | CXCR3F2PRSS1PRSS2PRSS3 | |
| SCHEMBL20503162 | 0.73 | CXCR3 (0.41) | CXCR3KMT2ASMN1; SMN2KDM4EMEN1 | |
| SCHEMBL12923324 | 0.73 | CXCR3 (0.36) | CXCR3KMT2AF2PRSS1PRSS2 | |
| SCHEMBL24595931 | 0.72 | CXCR3 (0.36) | CXCR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230148344-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20230148344-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20230146125-A1 | FORMS AND COMPOSITIONS OF INHIBITORS OF JAK2 | AJAX THERAPEUTICS, INC. | 2023-05-11 | — | — | US | disclosed |
| US-20230131253-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131253-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20220206386-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| US-11156917-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2021-10-26 | — | — | US | disclosed |
| US-20200062735-A1 | HETEROCYCLIC AMIDES AS KINASE INHIBITORS | GLAXOSMITHKLINE INTELLECTUAL PROPERTY DEVELOPMENT LIMITED (GB) | 2020-02-27 | — | — | US | disclosed |
| US-10248020-B2 | Acid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-04-02 | — | — | US | disclosed |
| US-20170315442-A1 | NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-02 | — | — | US | disclosed |
| US-20090286182-A1 | RESIST PROTECTIVE COATING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| CN-1242993-C | Heterocycle derivatives and drugs | NIPPON SHINYAKU CO LTD (JP) | 2006-02-22 | — | — | CN | disclosed |
| CN-1422255-A | Heterocycle derivatives and drugs | NIPPON SHINYAKU CO LTD (JP) | 2003-06-04 | — | — | CN | disclosed |
| CN-1183778-A | Quinolinecarboxylic acid derivs. | HOKURIKU PHARMACEUTICAL (JP) | 1998-06-03 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | ADH1A, ADH1C, POLR1A | CXCR3 4854/4885KMT2A 1048/4885F2 393/4885 |
| US-20200062735-A1 | HETEROCYCLIC AMIDES AS KINASE INHIBITORS | RIPK1, RIPK4, RIPK3 | CXCR3 1722/4885KMT2A 1354/4885F2 4753/4885 |
| US-20170315442-A1 | NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | ETV6, ELOVL5, ALAD | CXCR3 3065/4885KMT2A 2183/4885F2 4502/4885 |
| US-20230146125-A1 | FORMS AND COMPOSITIONS OF INHIBITORS OF JAK2 | JAK2, JAK1, JAK3 | CXCR3 1033/4885KMT2A 1636/4885F2 1008/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.