Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CETP | P11597 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | AR | P10275 | 1/20 | 0.35 |
| ▸ | AGXT | P21549 | 1/20 | 0.35 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706931 | 0.93 | CETP (0.42) | CETPTSHRALDH1A1CYP3A4MAPK1 | |
| SCHEMBL3482440 | 0.89 | TSHR (0.41) | CETPTSHRALDH1A1CYP3A4MAPK1 | |
| SCHEMBL704328 | 0.85 | TSHR (0.48) | TSHRALDH1A1MAPK1TDP1L3MBTL1 | |
| SCHEMBL3481843 | 0.83 | SIGMAR1 (0.41) | CETPIDO1SIGMAR1 | |
| SCHEMBL11418607 | 0.82 | TSHR (0.39) | TSHRALDH1A1MAPK1TDP1L3MBTL1 | |
| SCHEMBL27827367 | 0.82 | ALDH1A1 (0.39) | TSHRALDH1A1MAPK1TDP1L3MBTL1 | |
| SCHEMBL3482224 | 0.81 | IDO1 (0.44) | IDO1SIGMAR1 | |
| SCHEMBL703243 | 0.81 | TSHR (0.44) | CETPTSHRALDH1A1CYP3A4MAPK1 | |
| SCHEMBL3481685 | 0.80 | CETP (0.41) | CETPTSHRALDH1A1CYP3A4MAPK1 | |
| SCHEMBL27614298 | 0.77 | CETP (0.40) | CETPTSHRALDH1A1CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |