Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAPGEF4 | Q8WZA2 | 3/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 3/20 | 0.32 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.32 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.32 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31494229 | 0.75 | TP53 (0.33) | — | |
| SCHEMBL3482916 | 0.73 | L3MBTL1 (0.34) | RAPGEF4KDM4E | |
| SCHEMBL8384863 | 0.71 | RAPGEF4 (0.50) | RAPGEF4KDM4EALDH1A1LMNAGAA | |
| SCHEMBL1726231 | 0.71 | RAPGEF4 (0.43) | RAPGEF4ACHEKDM4EALDH1A1LMNA | |
| SCHEMBL3296111 | 0.70 | RAPGEF4 (0.38) | RAPGEF4KDM4EALDH1A1LMNAGAA | |
| SCHEMBL3482774 | 0.70 | ALDH1A1 (0.36) | ACHEALDH1A1 | |
| SCHEMBL3482261 | 0.70 | L3MBTL1 (0.33) | RAPGEF4FFAR4KDM4EALDH1A1LMNA | |
| SCHEMBL1635401 | 0.69 | RAPGEF4 (0.41) | RAPGEF4ACHEKDM4EALDH1A1LMNA | |
| SCHEMBL8380464 | 0.69 | RAPGEF4 (0.41) | RAPGEF4ACHEKDM4EALDH1A1LMNA | |
| SCHEMBL29776866 | 0.69 | RAPGEF4 (0.41) | RAPGEF4ACHEKDM4EALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |