Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | C5AR1 | P21730 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | THPO | P40225 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | CA12 | O43570 | 3/20 | 0.36 |
| ▸ | CA9 | Q16790 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29777962 | 1.00 | LMNA (0.40) | LMNAHTTSMN1; SMN2C5AR1CYP3A4 | |
| SCHEMBL31582661 | 0.90 | HSD11B1 (0.36) | ALDH1A1RECQLPTGS2TSHRTDP1 | |
| SCHEMBL2634677 | 0.90 | HSD11B1 (0.36) | ALDH1A1RECQLPTGS2TSHRTDP1 | |
| Phenolsulfonic Acid SCHEMBL5699278 | 0.86 | ENPP2 (0.42) | LMNAALDH1A1CA2PTGS2TSHR | |
| SCHEMBL5699304 | 0.84 | GAA (0.43) | LMNAHTTSMN1; SMN2GAAALDH1A1 | |
| SCHEMBL7908278 | 0.83 | ALDH1A1 (0.38) | ALDH1A1CA2PTGS2TSHRTDP1 | |
| Sulfuric Acid SCHEMBL8628602 | 0.83 | ALDH1A1 (0.38) | ALDH1A1CA2PTGS2TSHRTDP1 | |
| SCHEMBL4332359 | 0.82 | SLC22A12 (0.39) | CA12CA9CA1CA2PTGS2 | |
| Sulfuric Acid SCHEMBL8628604 | 0.82 | TDP1 (0.41) | ALDH1A1CA2PTGS2TSHRTDP1 | |
| SCHEMBL5851150 | 0.81 | GABRA1 (0.36) | LMNAHTTGAAALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | claimed |
| EP-2469337-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2012-06-27 | — | — | EP | claimed |
| EP-1744213-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-09-03 | — | — | EP | disclosed |
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-8420764-B2 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8236917-B2 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| US-20120178894-A1 | COMPOUND HAVING SILSESQUIOXANE SKELETON AND ITS POLYMER | INAGAKI JYUN-ICHI (JP) | 2012-07-12 | — | — | US | disclosed |
| EP-2469337-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20100240855-A1 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7705105-B2 | A cyclic polymer of silsesquioxane skeleton with side chains formed byhydrosilation of an unsaturated end group containing an active polymerfunctional group; polyimidesiloxane copolymers; polyestersiloxane copolymers; high molecular weight; thin films; strength; heat resistance;waterproofing; | CHISSO PETROCHEMICAL CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7638254-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-7435525-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070190344-A1 | Verification of translation | JNC CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070122733-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| EP-1744213-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical DuPont Microsystems Ltd. (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-6984473-B2 | Light blocking; amplified photoresist; acid generators; high density semiconductors | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2006-01-10 | — | — | US | disclosed |
| US-20050009982-A1 | Compound having silsesquioxane skeleton and its polymer | CHISSO CORPORATION (JP) | 2005-01-13 | — | — | US | disclosed |
| US-20030152845-A1 | Mask blank, protective film therefor and method of patterning mask blank | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-08-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050009982-A1 | Compound having silsesquioxane skeleton and its polymer | C1S, H1-4, H1-0 | LMNA 280/4885HTT 3025/4885SMN1; SMN2 1792/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.