SCHEMBL352173

SCHEMBL352173

C=CCOCC(=C)C(=O)OC(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
TSHR P16473 2/20 0.40
HTT P42858 1/20 0.38
CYP3A4 P08684 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.34
SMN1; SMN2 Q16637 3/20 0.33
HSD17B10 Q99714 1/20 0.33
PKM P14618 1/20 0.33
KMT2A Q03164 3/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
MEN1 O00255 2/20 0.32
LMNA P02545 1/20 0.32
MAPK1 P28482 1/20 0.32
RAB9A P51151 1/20 0.32
LIG1 P18858 1/20 0.32
NPSR1 Q6W5P4 1/20 0.31
KDM4E B2RXH2 2/20 0.31
CASP1 P29466 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19837886 0.87 ALDH1A1 (0.39) ALDH1A1TSHRHTTCYP3A4L3MBTL1
SCHEMBL351044 0.78 CYP3A4 (0.40) ALDH1A1TSHRHTTCYP3A4L3MBTL1
SCHEMBL350916 0.75 ALDH1A1 (0.44) ALDH1A1HTTCYP3A4L3MBTL1SMN1; SMN2
SCHEMBL350184 0.75 CYP2C19 (0.41) ALDH1A1TSHRCYP3A4SMN1; SMN2HSD17B10
SCHEMBL351309 0.73 L3MBTL1 (0.34) L3MBTL1SMN1; SMN2
SCHEMBL352013 0.73 CYP3A4 (0.40) ALDH1A1TSHRCYP3A4SMN1; SMN2HSD17B10
SCHEMBL19837888 0.72 MMP1 (0.43) ALDH1A1TSHRCYP3A4SMN1; SMN2HSD17B10
SCHEMBL30558867 0.72 THRB (0.41) ALDH1A1TSHRHTTCYP3A4L3MBTL1
SCHEMBL352190 0.72 THRB (0.55) ALDH1A1TSHRHTTCYP3A4L3MBTL1
SCHEMBL19837889 0.72 MMP1 (0.43) ALDH1A1TSHRCYP3A4SMN1; SMN2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
CN-111542554-B Polymer, curable resin composition, and use thereof 株式会社日本触媒 2022-03-18 CN disclosed
CN-111542554-A Polymer, curable resin composition, and use thereof 株式会社日本触媒 2020-08-14 CN disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed