Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CSNK1A1 | P48729 | 1/20 | 0.42 |
| ▸ | CLK2 | P49760 | 1/20 | 0.42 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.42 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.42 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.42 |
| ▸ | DYRK1B | Q9Y463 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.36 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.34 |
| ▸ | EGLN2 | Q96KS0 | 6/20 | 0.34 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5420423 | 0.73 | ALDH1A1 (0.44) | CSNK1A1CLK2LIMK1DYRK1ACLK4 | |
| SCHEMBL1650004 | 0.72 | ALDH1A1 (0.49) | ALDH1A1POLBGAAKDM4ERCE1 | |
| Hydrochloric Acid SCHEMBL31049672 | 0.70 | ALDH1A1 (0.47) | ALDH1A1POLBGAAKDM4ERCE1 | |
| SCHEMBL609328 | 0.69 | ALDH1A1 (0.50) | ALDH1A1POLBGAA | |
| SCHEMBL5411017 | 0.67 | DGAT1 (0.41) | CSNK1A1CLK2LIMK1DYRK1ACLK4 | |
| SCHEMBL21637046 | 0.67 | SMPD3 (0.38) | CSNK1A1CLK2LIMK1DYRK1ACLK4 | |
| SCHEMBL3547481 | 0.67 | EGLN2 (0.45) | CLK4EGLN2 | |
| SCHEMBL9373335 | 0.67 | LMNA (0.40) | ALDH1A1POLBGAAKDM4ERCE1 | |
| SCHEMBL7074320 | 0.67 | — | — | |
| SCHEMBL5096009 | 0.66 | EGLN2 (0.50) | DYRK1AALDH1A1GAAKDM4ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119735985-B | Waterproof coating coated on surface of underground coal mine equipment and preparation method thereof | 神木市启星煤炭自动化设备有限公司 | 2025-05-20 | — | — | CN | claimed |
| CN-119735985-A | Waterproof coating coated on surface of underground coal mine equipment and preparation method thereof | 神木市启星煤炭自动化设备有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119285947-A | Low-temperature curing polyimide precursor solution and preparation method thereof | 北京化工大学常州先进材料研究院 | 2025-01-10 | — | — | CN | claimed |
| WO-2023191400-A1 | ETHYL PIPERIDINE TRIAZOLO TRIAZINE DERIVATIVES, SYNTHESIS METHOD THEREFOR, AND PHARMACEUTICAL COMPOSITION CONTAINING SAME FOR PREVENTION OR TREATMENT OF CANCER | 에이치케이이노엔 주식회사 | 2023-10-05 | — | — | WO | claimed |
| EP-1633756-A2 | A2A ADENOSINE RECEPTOR ANTAGONISTS | Biogen Idec MA Inc. (US) | 2006-03-15 | — | — | EP | claimed |
| WO-2004092173-A2 | A2A ADENOSINE RECEPTOR ANTAGONISTS | BIOGEN IDEC MA INC. (US) | 2004-10-28 | — | — | WO | claimed |
| WO-2026100079-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100734-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-09 | — | — | US | disclosed |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-03-05 | — | — | US | disclosed |
| US-12504688-B2 | Negative photosensitive resin composition and method for manufacturing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-12-23 | — | — | US | disclosed |
| CN-105980603-A | Etching liquid, replenishing liquid, and method for forming copper wiring | MEC股份有限公司 | 2016-09-28 | — | — | CN | disclosed |
| CN-102375336-B | Manufacturing method of photosensitive resin composition and solidified embossing pattern, and semiconductor device | ASAHI KASEI E MATERIALS CORP | 2013-10-09 | — | — | CN | disclosed |
| CN-102375336-A | Manufacturing Method Of Photosensitive Resin Composition And Solidified Embossing Pattern, And Semiconductor Device | ASAHI KASEI E MATERIALS CORP | 2012-03-14 | — | — | CN | disclosed |
| US-7834014-B2 | Parkinson's disease; [2-(7-amino-2-furan-2-yl-[1,2,4]triazolo[1,5-a][1,3,5]triazin-5-yl)-octahydro-pyrido[1,2-a]pyrazin-7-yl]-methanol; | BIOGEN IDEC MA INC. (US) | 2010-11-16 | — | — | US | disclosed |
| US-7285550-B2 | Triazolotriazines and pyrazolotriazines and methods of making and using the same | BIOGEN IDEC MA INC. (US) | 2007-10-23 | — | — | US | disclosed |
| US-20070173505-A1 | A2a adenosine receptor antagonists | BIOGEN IDEC MA INC. | 2007-07-26 | — | — | US | disclosed |
| US-20060276475-A1 | Triazolotriazines and pyrazolotriazines and methods of making and using the same | BIOGEN IDEC MA INC. | 2006-12-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | CSNK1A1 1037/4885CLK2 4130/4885LIMK1 3785/4885 |
| US-20070173505-A1 | A2a adenosine receptor antagonists | ADORA2A, ADORA1, ADORA3 | CSNK1A1 2796/4885CLK2 2485/4885LIMK1 3573/4885 |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | CD79B, ITGA1, PTK2 | CSNK1A1 298/4885CLK2 3089/4885LIMK1 3243/4885 |
| US-20060276475-A1 | Triazolotriazines and pyrazolotriazines and methods of making and using the same | ADORA2A, ADORA3, ADORA1 | CSNK1A1 2412/4885CLK2 1364/4885LIMK1 3527/4885 |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ARCN1, PBRM1, LCP1 | CSNK1A1 2238/4885CLK2 4287/4885LIMK1 2256/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.