SCHEMBL3620199

SCHEMBL3620199

CCCCCC(C(=O)OC(C)c1ccccc1[N+](=O)[O-])C(=O)OC(C)c1ccccc1[N+](=O)[O-]

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.52
ALDH1A1 P00352 2/20 0.48
CYP1A2 P05177 2/20 0.41
TSHR P16473 1/20 0.41
MAPT P10636 2/20 0.41
CRHBP P24387 1/20 0.41
CRHR2 Q13324 1/20 0.41
KMT2A Q03164 1/20 0.40
GAA P10253 2/20 0.40
HPGD P15428 1/20 0.40
CASR P41180 1/20 0.38
POLB P06746 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ESR1 P03372 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8859457 0.87 ALDH1A1 (0.45) L3MBTL1ALDH1A1CYP1A2TSHRKMT2A
SCHEMBL27905940 0.85 ALDH1A1 (0.48) L3MBTL1ALDH1A1CYP1A2TSHRKMT2A
SCHEMBL27889292 0.82 CTSL (0.47) ALDH1A1CYP1A2TSHRMAPTKMT2A
SCHEMBL13347474 0.80 ALDH1A1 (0.59) ALDH1A1CYP1A2TSHRMAPTKMT2A
SCHEMBL3619558 0.79 MGLL (0.51) ALDH1A1KMT2AGAAHPGD
SCHEMBL9056702 0.79 MGLL (0.51) ALDH1A1KMT2AGAAHPGD
SCHEMBL7719022 0.78 KMT2A (0.54) ALDH1A1CYP1A2TSHRKMT2AGAA
SCHEMBL5583434 0.78 ALDH1A1 (0.56) ALDH1A1CYP1A2TSHRMAPTGAA
SCHEMBL14503207 0.78 ALDH1A1 (0.52) ALDH1A1CYP1A2TSHRMAPTKMT2A
SCHEMBL29674293 0.78 L3MBTL1 (0.57) L3MBTL1ALDH1A1TSHRMAPTCRHBP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US claimed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US claimed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO claimed
EP-3374467-B1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC TECH AG (CH) 2020-04-15 EP disclosed
US-20180320072-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS Rolic Technologies AG (CH) 2018-11-08 US disclosed
EP-3374467-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC Technologies AG (CH) 2018-09-19 EP disclosed
WO-2017080977-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC AG (CH) 2017-05-18 WO disclosed
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US disclosed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US disclosed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO disclosed