SCHEMBL3695200

SCHEMBL3695200

O=C(Cl)CCC(F)(F)C(F)(F)Br

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.35
ALDH1A1 P00352 2/20 0.32
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1771607 0.86 ALDH1A1 (0.39) TSHRALDH1A1TP53
SCHEMBL9438220 0.85 TSHR (0.41) TSHRALDH1A1TP53
SCHEMBL9438217 0.80 TSHR (0.38) TSHRALDH1A1TP53
SCHEMBL5855950 0.80 TSHR (0.38) TSHRALDH1A1TP53
SCHEMBL3698957 0.78 LMNA (0.38) TSHRALDH1A1
SCHEMBL9438164 0.78 TSHR (0.36) TSHRALDH1A1TP53
SCHEMBL1727128 0.76 TSHR (0.35) TSHRALDH1A1TP53
SCHEMBL1727544 0.74 THRB (0.34) TSHRALDH1A1TP53
SCHEMBL330245 0.74
SCHEMBL11249683 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110124106-B Surface-modified acellular biological tissue material and preparation method and application thereof 上海交通大学 2020-11-06 CN disclosed
CN-110124106-A A kind of acellular organism organization material of surface modification and the preparation method and application thereof 上海交通大学 2019-08-16 CN disclosed
US-20170248844-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-08-31 US disclosed
US-9720321-B2 Lactone photoacid generators and resins and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-08-01 US disclosed
US-9720321-B2 Lactone photoacid generators and resins and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-08-01 US disclosed
US-9720321-B2 Lactone photoacid generators and resins and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-08-01 US disclosed
US-8956799-B2 Photoacid generator and photoresist comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-8956799-B2 Photoacid generator and photoresist comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-8956799-B2 Photoacid generator and photoresist comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-07-04 US disclosed
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-07-04 US disclosed
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-07-04 US disclosed
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
EP-2452941-A1 Lactone photoacid generators and resins and photoresists comprising same Rohm and Haas Electronic Materials LLC (US) 2012-05-16 EP disclosed
EP-2452941-A1 Lactone photoacid generators and resins and photoresists comprising same Rohm and Haas Electronic Materials LLC (US) 2012-05-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME F10, C1S, H1-0 TSHR 622/4885ALDH1A1 472/4885TP53 3088/4885
US-20170248844-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION WASF2, FRG1, WEE2 TSHR 4473/4885ALDH1A1 4239/4885TP53 3834/4885
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME PGLS, GGPS1, GSS TSHR 3232/4885ALDH1A1 1173/4885TP53 1773/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.