Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.42 |
| ▸ | KIF11 | P52732 | 3/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | NT5E | P21589 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | RXRA | P19793 | 1/20 | 0.39 |
| ▸ | RXRB | P28702 | 1/20 | 0.39 |
| ▸ | RXRG | P48443 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8949511 | 0.98 | ALDH1A1 (0.41) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| SCHEMBL12406442 | 0.89 | KIF11 (0.41) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| SCHEMBL3193910 | 0.84 | KIF11 (0.56) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| SCHEMBL3189180 | 0.84 | ERAP1 (0.46) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| SCHEMBL20752520 | 0.83 | KIF11 (0.44) | ALDH1A1KIF11LMNATSHRRXRA | |
| SCHEMBL11243895 | 0.82 | FFAR4 (0.54) | ALDH1A1HSD17B10TSHRNT5ETDP1 | |
| SCHEMBL10763658 | 0.82 | MEP1B (0.55) | ALDH1A1HSD17B10LMNATSHRSMN1; SMN2 | |
| SCHEMBL776654 | 0.82 | TAS2R14 (0.39) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| Hydrochloric Acid SCHEMBL28102869 | 0.82 | ERAP1 (0.45) | ALDH1A1HSD17B10KIF11LMNAPTPN11 | |
| SCHEMBL11516738 | 0.82 | ALDH1A1 (0.56) | ALDH1A1HSD17B10KIF11TSHRNT5E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0569884-B1 | Rust inhibitor | UNION CHEMICAL CO LTD (JP) | 1996-09-18 | — | — | EP | claimed |
| US-11754927-B2 | Photoresist pattern trimming compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-09-12 | — | — | US | disclosed |
| US-11754927-B2 | Photoresist pattern trimming compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-09-12 | — | — | US | disclosed |
| US-20200379353-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-12-03 | — | — | US | disclosed |
| US-20200379351-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-12-03 | — | — | US | disclosed |
| EP-2577397-A1 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION | FUJIFILM Corporation (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| WO-2012043866-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | WO | disclosed |
| WO-2012008510-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | WO | disclosed |
| WO-2011149035-A1 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-12-01 | — | — | WO | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7060414-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-06-13 | — | — | US | disclosed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| WO-2002069039-A9 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY CO LLC (US) | 2004-05-06 | — | — | WO | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11754927-B2 | Photoresist pattern trimming compositions and pattern formation methods | AHR, ALKBH1, CNOT1 | ALDH1A1 298/4885HSD17B10 444/4885KIF11 522/4885 |
| US-20200379353-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS | AHR, ALKBH1, CNOT1 | ALDH1A1 298/4885HSD17B10 444/4885KIF11 522/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.