SCHEMBL3794342

SCHEMBL3794342

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.O=S(=O)([O-])CC(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
RORA P35398 1/20 0.41
ALDH1A1 P00352 2/20 0.37
HSD11B1 P28845 12/20 0.36
PDK1 Q15118 1/20 0.36
PDK2 Q15119 1/20 0.36
PDK3 Q15120 1/20 0.36
PDK4 Q16654 1/20 0.36
ACHE P22303 1/20 0.35
EEF2K O00418 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL482028 0.81 ALDH1A1 (0.48) ALDH1A1HSD11B1ACHE
SCHEMBL4483664 0.80 ALDH1A1 (0.47) ALDH1A1HSD11B1ACHE
SCHEMBL3789669 0.78 HSD11B1 (0.34) RORAALDH1A1HSD11B1PDK1PDK2
SCHEMBL218163 0.78 ALDH1A1 (0.46) ALDH1A1HSD11B1ACHE
Trifluoromethanesulfonic Acid SCHEMBL36627 0.78 ALDH1A1 (0.46) RORAALDH1A1HSD11B1ACHE
Sulfuric Acid SCHEMBL5068665 0.78 ALDH1A1 (0.52) ALDH1A1HSD11B1ACHE
SCHEMBL3174077 0.77 ALDH1A1 (0.42) RORAALDH1A1HSD11B1PDK1PDK2
SCHEMBL3211989 0.77 ALDH1A1 (0.44) RORAALDH1A1HSD11B1ACHE
Sulfuric Acid SCHEMBL482026 0.76 ALDH1A1 (0.50) ALDH1A1HSD11B1ACHE
SCHEMBL1718940 0.76 ALDH1A1 (0.50) ALDH1A1HSD11B1ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283104-B2 Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-09 US disclosed
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME DAP3, MRPS23, ASIC3 RORA 3298/4885ALDH1A1 4399/4885HSD11B1 4291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.