SCHEMBL3794378

SCHEMBL3794378

O=C(CC12CC3CC(CC(C3)C1)C2)OC(CS(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.40
MEN1 O00255 2/20 0.40
P2RX7 Q99572 6/20 0.39
LMNA P02545 1/20 0.36
CA12 O43570 1/20 0.35
CA9 Q16790 1/20 0.35
EPHX2 P34913 2/20 0.35
ALDH1A1 P00352 1/20 0.35
HTT P42858 1/20 0.35
RAB9A P51151 2/20 0.35
NPC1 O15118 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3790174 0.85 ALDH1A1 (0.42) KMT2ACA9ALDH1A1RAB9ANPC1
SCHEMBL3794372 0.78 MEN1 (0.39) KMT2AMEN1P2RX7LMNACA12
SCHEMBL11991284 0.77 LMNA (0.38) KMT2AMEN1LMNACA12CA9
SCHEMBL14353323 0.77 NPC1 (0.32) KMT2AALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL3786564 0.74 HSD11B1 (0.39) KMT2AMEN1ALDH1A1HTTSMN1; SMN2
SCHEMBL19529502 0.72 ALDH1A1 (0.42) KMT2AMEN1P2RX7LMNAEPHX2
SCHEMBL24861662 0.70 ALDH1A1 (0.42) KMT2AMEN1LMNAEPHX2ALDH1A1
SCHEMBL515602 0.70 P2RX7 (0.37) KMT2AMEN1P2RX7CA12CA9
SCHEMBL961708 0.70 KMT2A (0.37) KMT2AMEN1P2RX7CA9EPHX2
SCHEMBL3791469 0.69 HSD11B1 (0.41) KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283104-B2 Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-09 US disclosed
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME DAP3, MRPS23, ASIC3 KMT2A 2736/4885MEN1 4475/4885P2RX7 1456/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.