Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 5/20 | 0.68 |
| ▸ | TLR2 | O60603 | 1/20 | 0.68 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.68 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.68 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.46 |
| ▸ | ESR1 | P03372 | 1/20 | 0.46 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.46 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.46 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | GGT1 | P19440 | 1/20 | 0.46 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.46 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL870959 | 0.86 | ALDH1A1 (0.55) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL7200176 | 0.86 | TLR2 (0.50) | ERN1TLR2TLR1TLR6MAPK1 | |
| Benzene SCHEMBL3155472 | 0.85 | ALDH1A1 (0.58) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL21579710 | 0.84 | ERN1 (0.67) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL8766243 | 0.84 | KDM4E (0.55) | ERN1TLR2TLR1TLR6MAPK1 | |
| SCHEMBL5241671 | 0.84 | MAPK1 (0.57) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL30331767 | 0.84 | ERN1 (0.56) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL2390071 | 0.84 | ERN1 (0.56) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL5047419 | 0.84 | ERN1 (0.51) | ERN1TLR2TLR1TLR6PTGDR2 | |
| SCHEMBL8409471 | 0.83 | ERN1 (0.60) | ERN1TLR2TLR1TLR6PTGDR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9187510-B2 | Light-emitting organic platinum complex, light-emitting material containing this complex and functional device | OSAKA UNIVERSITY (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| EP-2816409-A1 | Method for forming a resist under layer film and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-20140335692-A1 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-20140335692-A1 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-7592498-B2 | Metathesis catalysts | LANXESS DEUTSCHLAND GMBH (DE) | 2009-09-22 | — | — | US | disclosed |
| US-7592498-B2 | Metathesis catalysts | LANXESS DEUTSCHLAND GMBH (DE) | 2009-09-22 | — | — | US | disclosed |
| US-7592498-B2 | Metathesis catalysts | LANXESS DEUTSCHLAND GMBH (DE) | 2009-09-22 | — | — | US | disclosed |
| US-20080139861-A1 | Metathesis catalysts | ARLANXEO DEUTSCHLAND GMBH (DE) | 2008-06-12 | — | — | US | disclosed |
| US-20080139861-A1 | Metathesis catalysts | ARLANXEO DEUTSCHLAND GMBH (DE) | 2008-06-12 | — | — | US | disclosed |
| US-20080139861-A1 | Metathesis catalysts | ARLANXEO DEUTSCHLAND GMBH (DE) | 2008-06-12 | — | — | US | disclosed |
| EP-1394190-B1 | Metathesis catalysts | SALTIGO GMBH (DE) | 2007-01-03 | — | — | EP | disclosed |
| EP-1394190-B1 | Metathesis catalysts | SALTIGO GMBH (DE) | 2007-01-03 | — | — | EP | disclosed |
| US-20040087438-A1 | Metathesis catalysts | ARLANXEO DEUTSCHLAND GMBH (DE) | 2004-05-06 | — | — | US | disclosed |
| EP-1394190-A1 | Metathesis catalysts | Bayer Chemicals AG (DE) | 2004-03-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080139861-A1 | Metathesis catalysts | PPOX, PIN4, ICMT | ERN1 2687/4885TLR2 4168/4885TLR1 3767/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.