SCHEMBL3870569

SCHEMBL3870569

CC(=CCc1ccc(O)c(C(C)(C)C)c1)C(N)=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
ALOX15 P16050 3/20 0.41
HSD17B10 Q99714 2/20 0.41
NR1I2 O75469 1/20 0.41
LMNA P02545 1/20 0.41
CYP2C9 P11712 1/20 0.41
MIF P14174 1/20 0.41
TYR P14679 1/20 0.41
HTT P42858 1/20 0.41
NFE2L2 Q16236 1/20 0.41
HSP90AA1 P07900 4/20 0.40
HSP90AB1 P08238 4/20 0.40
RARB P10826 2/20 0.40
RARG P13631 2/20 0.40
RARA P10276 1/20 0.40
ESRRA P11474 1/20 0.40
NR1H4 Q96RI1 3/20 0.37
CYP1A2 P05177 3/20 0.36
MAPT P10636 3/20 0.36
KDM4E B2RXH2 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5228346 0.84 ALDH1A1 (0.47) ALDH1A1ALOX15LMNACYP2C9TYR
SCHEMBL28232838 0.83 ESRRA (0.41) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL339752 0.83 XDH (0.49) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL339754 0.83 XDH (0.49) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL3864569 0.78 ALDH1A1 (0.42) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL2338216 0.78 ALDH1A1 (0.52) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL3869765 0.75 CA2 (0.47) ALDH1A1KDM4EBLM
SCHEMBL2641096 0.73 XDH (0.61) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL10519843 0.73 GAA (0.48) ALDH1A1ALOX15HSD17B10NR1I2LMNA
SCHEMBL18194421 0.72 ALOX15 (0.51) ALDH1A1ALOX15HSD17B10NR1I2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1729176-B1 POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORP (JP) 2017-06-28 EP disclosed
US-7482111-B2 Negative radiation-sensitive resin composition JSR CORPORATION (JP) 2009-01-27 US disclosed
US-20070190450-A1 Negative radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-16 US disclosed
US-20070190465-A1 Positively radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-16 US disclosed
EP-1746461-A1 NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2007-01-24 EP disclosed
EP-1729176-A1 POSITIVELY RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-06 EP disclosed