SCHEMBL396728

SCHEMBL396728

C=C(C)C(=O)Nc1ccc(S(=O)(=O)NCCCC)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.58
LMNA P02545 9/20 0.58
ALDH1A1 P00352 5/20 0.56
KMT2A Q03164 4/20 0.56
MEN1 O00255 3/20 0.56
HTT P42858 3/20 0.56
SMN1; SMN2 Q16637 4/20 0.55
MAPT P10636 3/20 0.54
TP53 P04637 2/20 0.54
GPR55 Q9Y2T6 1/20 0.53
NAMPT P43490 1/20 0.52
GAA P10253 2/20 0.50
NPY1R P25929 1/20 0.50
NPY2R P49146 1/20 0.50
ALOX12 P18054 1/20 0.50
PKM P14618 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49
MAPK1 P28482 1/20 0.48
CYP1A2 P05177 1/20 0.47
CYP2D6 P10635 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL398015 0.92 POLB (0.61) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL393581 0.86 LMNA (0.59) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL4594909 0.86 POLB (0.79) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL392740 0.85 ALDH1A1 (0.51) LMNAALDH1A1KMT2AMEN1MAPT
SCHEMBL4066416 0.82 POLB (0.77) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL9568580 0.81 TGM2 (0.58) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL9775630 0.81 POLB (0.75) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL19262185 0.80 LMNA (0.63) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL11225042 0.80 CA12 (0.51) POLBLMNAALDH1A1KMT2AMEN1
SCHEMBL394902 0.80 CA1 (0.59) POLBLMNAALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US claimed
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-8101332-B2 Negative-working lithographic printing plate precursor and method of lithographic printing using same FUJIFILM CORPORATION (JP) 2012-01-24 US disclosed
EP-1972440-B1 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM CORP (JP) 2010-06-23 EP disclosed
EP-1136886-B1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORP (JP) 2010-05-19 EP disclosed
US-20090246688-A1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-2105298-A1 Negative-working lithographic printing plate precursor and method of lithographic printing using same Fujifilm Corporation (JP) 2009-09-30 EP disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 EP disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0330239-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-22 EP disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed
EP-0022813-A4 IMAGING COMPOSITION FEATURING AROMATIC DIALDEHYDE-RETAINING BINDERS. EASTMAN KODAK CO (US) 1982-04-29 EP disclosed
EP-0022813-A1 IMAGING COMPOSITION FEATURING AROMATIC DIALDEHYDE-RETAINING BINDERS. EASTMAN KODAK CO (US) 1981-01-28 EP disclosed
US-4225689-A PHOTORESISTS, LITHOGRAPHIC PLATES, RELIF IMAGES EASTMAN KODAK COMPANY (US) 1980-09-30 US disclosed
WO-1980001322-A1 IMAGING COMPOSITION FEATURING AROMATIC DIALDEHYDE-RETAINING BINDERS EASTMAN KODAK CO (US) 1980-06-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 POLB 3689/4885LMNA 780/4885ALDH1A1 1302/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.