Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24592054 | 1.00 | EPHX2 (0.50) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL22137265 | 0.82 | EPHX2 (0.33) | EPHX2 | |
| SCHEMBL36264 | 0.80 | GAA (0.44) | EPHX2TSHRALDH1A1POLBGAA | |
| SCHEMBL1046838 | 0.80 | EPHX2 (0.46) | EPHX2TSHRNPSR1 | |
| Hydrochloric Acid SCHEMBL28181407 | 0.78 | GAA (0.42) | EPHX2TSHRALDH1A1POLBGAA | |
| Water SCHEMBL2573342 | 0.78 | GAA (0.42) | EPHX2TSHRALDH1A1POLBGAA | |
| SCHEMBL15772817 | 0.78 | GAA (0.42) | EPHX2TSHRALDH1A1POLBGAA | |
| SCHEMBL1239169 | 0.78 | GAA (0.42) | EPHX2TSHRALDH1A1POLBGAA | |
| SCHEMBL15773055 | 0.78 | GAA (0.42) | EPHX2TSHRALDH1A1POLBGAA | |
| Ethylene SCHEMBL1043237 | 0.77 | EPHX2 (0.43) | EPHX2TSHRNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11333978-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing solid-state imaging element | FUJIFILM CORPORATION (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20210072642-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN | FUJIFILM CORPORATION (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210011378-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING THE SAME, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-01-14 | — | — | US | disclosed |
| US-20200393756-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-12-17 | — | — | US | disclosed |
| US-20200183274-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-06-11 | — | — | US | disclosed |
| US-20200142306-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT | FUJIFILM CORPORATION (JP) | 2020-05-07 | — | — | US | disclosed |
| WO-2019188455-A1 | ACTINIC-RAY-RESPONSIVE OR RADIATION-RESPONSIVE RESIN COMPOSITION, ACTINIC-RAY-RESPONSIVE OR RADIATION-RESPONSIVE FILM, PATTERN FORMATION METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND POLYESTER | 富士フイルム株式会社 | 2019-10-03 | — | — | WO | disclosed |
| EP-1188743-B1 | PROCESS FOR PREPARING ORGANIC SULFUR ACIDS OR SALTS THEREOF | DAICEL CHEM (JP) | 2009-06-17 | — | — | EP | disclosed |
| US-6706915-B2 | USING A METAL COMPOUND AS A CATALYST, A CORRESPONDING ORGANIC SULFONIC ACID OR A SALT CAN BE OBTAINED BY REACTING AN ORGANIC SUBSTRATE WITH A SULFUR OXIDE IN THE ABSENCE OF N-HYDROXY AND N-OXO CYCLIC IMIDE COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-16 | — | — | US | disclosed |
| US-20020161255-A1 | Process for preparing organic sulfur acids or salts thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-10-31 | — | — | US | disclosed |
| EP-1188743-A1 | PROCESS FOR PREPARING ORGANIC SULFUR ACIDS OR SALTS THEREOF | Daicel Chemical Industries, Ltd. (JP) | 2002-03-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200393756-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | ACTR5, ACTR3, ACTR2 | EPHX2 240/4885TSHR 568/4885NPSR1 613/4885 |
| US-20020161255-A1 | Process for preparing organic sulfur acids or salts thereof | BHMT2, TST, ICMT | EPHX2 691/4885TSHR 4312/4885NPSR1 1479/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | EPHX2 542/4885TSHR 3144/4885NPSR1 2926/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.