SCHEMBL4016910

SCHEMBL4016910

O=S(=O)([O-])CCCc1nc2ccccc2[nH]1.[Na+]

nearest known ligand 0.66

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.66
LMNA P02545 2/20 0.58
GAA P10253 1/20 0.58
KMT2A Q03164 1/20 0.58
NPC1 O15118 1/20 0.53
RAB9A P51151 1/20 0.53
CHRM1 P11229 1/20 0.52
PDE10A Q9Y233 1/20 0.51
DDAH1 O94760 1/20 0.49
HTT P42858 1/20 0.48
KDM4E B2RXH2 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29632074 0.85 POLB (0.70) POLBLMNAGAAKMT2ANPC1
SCHEMBL4015086 0.85 POLB (0.70) POLBLMNAGAAKMT2ANPC1
SCHEMBL5067127 0.81 POLB (0.73) POLBLMNAGAAKMT2ANPC1
SCHEMBL7006523 0.81 POLB (1.00) POLBGAANPC1RAB9ACHRM1
SCHEMBL7854448 0.81 POLB (0.92) POLBGAAKMT2ANPC1RAB9A
SCHEMBL7856315 0.79 POLB (0.96) POLBGAAKMT2ANPC1RAB9A
SCHEMBL7854826 0.79 POLB (0.96) POLBGAAKMT2ANPC1RAB9A
SCHEMBL30701863 0.79 POLB (0.96) POLBGAAKMT2ANPC1RAB9A
SCHEMBL7856311 0.79 POLB (0.96) POLBGAAKMT2ANPC1RAB9A
SCHEMBL30701864 0.79 POLB (0.96) POLBGAAKMT2ANPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1085540-B1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PREPARING THE SAME SHOWA DENKO KK (JP) 2009-07-01 EP disclosed
EP-1158551-B1 SOLID ELECTROLYTIC CAPACITOR AND ITS PRODUCTION METHOD SHOWA DENKO KK (JP) 2008-11-19 EP disclosed
EP-1811532-A2 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-07-25 EP disclosed
US-20060179627-A1 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. 2006-08-17 US disclosed
US-7087292-B2 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. (JP) 2006-08-08 US disclosed
US-7060205-B2 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2006-06-13 US disclosed
US-20040212951-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2004-10-28 US disclosed
US-6783703-B2 ELECTRICALLY CONDUCTING CARBON PASTE FOR SOLID ELECTROLYTIC CAPACITORS COMPRISING AN ELECTRICALLY CONDUCTING CARBON MATERIAL, A BINDER, AND A SOLVENT, WHEREIN THE CONDUCTING CARBON MATERIAL CONTAINS ARTIFICIAL GRAPHITE SHOWA DENKO KABUSHIKI KAISHA (JP) 2004-08-31 US disclosed
US-20040136145-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2004-07-15 US disclosed
US-6696138-B2 POROUS VALVE ACTING METAL HAVING DIELECTRIC FILM SHOWA DENKO K.K. (JP) 2004-02-24 US disclosed
US-20030148023-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2003-08-07 US disclosed
US-6517892-B1 Forming electroconductive film filling microfine pores and covering dielectric layer; oxidative solution polymerization; such as cationic polythiophene or polyfuran SHOWA DENKO K.K. (JP) 2003-02-11 US disclosed
US-6466421-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. (JP) 2002-10-15 US disclosed
US-20020105777-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2002-08-08 US disclosed
US-6381121-B1 Solid electrolytic capacitor SHOWA DENKO KABUSHIKI KAISHA (JP) 2002-04-30 US disclosed
EP-1190426-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME Showa Denko K K (JP) 2002-03-27 EP disclosed
US-6344966-B1 ELECTRICALLY CONDUCTING POLYMER LAYER CONTAINS AS A DOPANT AN ANION OF(1) ALKOXY-SUBSTITUTED NAPHTHALENESULFONATE, (2) A HETEROCYCLIC SULFONATE, OR (3) AN ANION OF AN ALIPHATIC POLYCYCLIC COMPOUND SHOWA DENKO K.K. (JP) 2002-02-05 US disclosed
EP-1158551-A1 SOLID ELECTROLYTIC CAPACITOR AND ITS PRODUCTION METHOD Showa Denko K K (JP) 2001-11-28 EP disclosed
EP-1085540-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PREPARING THE SAME Showa Denko K K (JP) 2001-03-21 EP disclosed
WO-2000060620-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME SHOWA DENKO K. K. (JP) 2000-10-12 WO disclosed