SCHEMBL4125638

SCHEMBL4125638

[O]S(=O)(=O)c1ccc(CCl)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 13/20 0.46
CA1 P00915 11/20 0.46
CA12 O43570 7/20 0.38
CA9 Q16790 7/20 0.38
CA4 P22748 4/20 0.38
CA6 P23280 4/20 0.38
CA5A P35218 4/20 0.38
CA7 P43166 4/20 0.38
CA14 Q9ULX7 4/20 0.38
CA5B Q9Y2D0 4/20 0.38
MAPT P10636 1/20 0.37
PSIP1 O75475 1/20 0.35
F2 P00734 2/20 0.34
TMPRSS4 Q9NRS4 2/20 0.34
TP53 P04637 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
TSHR P16473 1/20 0.34
KMT2A Q03164 1/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3539406 0.82 CYP3A4 (0.52) CA2CA1CA12CA9CA4
SCHEMBL396619 0.80 ALDH1A1 (0.50) CA2CA1CA12CA9CA4
SCHEMBL2304051 0.78 CA2 (0.64) CA2CA1CA12CA9CA4
SCHEMBL1595559 0.78 CA2 (0.45) CA2CA1CA12CA9CA4
SCHEMBL1596586 0.78 CA2 (0.45) CA2CA1CA12CA9CA4
SCHEMBL11205634 0.78 F2 (0.57) CA2CA1CA12CA9CA4
SCHEMBL3386871 0.78 LMNA (0.52) CA2CA1CA12CA9CA4
SCHEMBL14830747 0.78 CA2 (0.48) CA2CA1CA12CA9CA4
SCHEMBL398570 0.78 ENPP2 (0.50) CA2CA1CYP3A4
SCHEMBL6063750 0.76 CA2 (0.61) CA2CA1CA12CA9CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090253881-A1 POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER IDEMITSU KOSAN CO., LTD. (JP) 2009-10-08 US disclosed
EP-1882705-A1 POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER IDEMITSU KOSAN CO., LTD. (JP) 2008-01-30 EP disclosed