Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP1 | P03956 | 11/20 | 0.39 |
| ▸ | MMP2 | P08253 | 11/20 | 0.39 |
| ▸ | MMP9 | P14780 | 11/20 | 0.39 |
| ▸ | MMP8 | P22894 | 11/20 | 0.39 |
| ▸ | MMP13 | P45452 | 11/20 | 0.39 |
| ▸ | CA2 | P00918 | 10/20 | 0.39 |
| ▸ | CA1 | P00915 | 8/20 | 0.39 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.34 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.34 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.34 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8773070 | 0.97 | MMP1 (0.39) | MMP1MMP2MMP9MMP8MMP13 | |
| Potassium Ion SCHEMBL7966881 | 0.88 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 | |
| Potassium Ion SCHEMBL7968724 | 0.88 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 | |
| Potassium Ion SCHEMBL7972093 | 0.88 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 | |
| Potassium Ion SCHEMBL2891322 | 0.88 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 | |
| Potassium Ion SCHEMBL7966004 | 0.87 | MMP1 (0.41) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL25246586 | 0.85 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL5436074 | 0.85 | MMP1 (0.43) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL7956159 | 0.85 | MMP1 (0.43) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL6880862 | 0.85 | MMP1 (0.40) | MMP1MMP2MMP9MMP8MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090042390-A1 | ETCHANT FOR SILICON WAFER SURFACE SHAPE CONTROL AND METHOD FOR MANUFACTURING SILICON WAFERS USING THE SAME | SUMCO CORPORATION (JP) | 2009-02-12 | — | — | US | claimed |
| US-20090042390-A1 | ETCHANT FOR SILICON WAFER SURFACE SHAPE CONTROL AND METHOD FOR MANUFACTURING SILICON WAFERS USING THE SAME | SUMCO CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| EP-1300725-B1 | Method of producing thermal-developable photosensitive material | FUJIFILM CORP (JP) | 2007-07-04 | — | — | EP | disclosed |
| EP-1798608-A1 | Hologram production method and hologram production system employing silver halide photosensitive material | Fujifilm Corporation (JP) | 2007-06-20 | — | — | EP | disclosed |
| US-7144663-B2 | Method and apparatus for liquid preparation of photographic reagent | FUJI PHOTO FILM CO., LTD. (JP) | 2006-12-05 | — | — | US | disclosed |
| EP-0789272-B1 | Developer for silver halide photographic photosensitive material | FUJI PHOTO FILM CO LTD (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20060099438-A1 | Metal plating structure and method for production thereof | SHINSHU UNIVERSITY (JP) | 2006-05-11 | — | — | US | disclosed |
| EP-1624337-A2 | Silver halide holographic sensitive material and system for taking holographic images by using the same | Fuji Photo Film Co., Ltd. (JP) | 2006-02-08 | — | — | EP | disclosed |
| EP-1564314-A1 | METAL PLATING STRUCTURE AND METHOD FOR PRODUCTION THEREOF | Shinshu University (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-6821720-B2 | FORMING, ON A SUBSTRATE, A PHOTOSENSITIVE LAYER, A PROTECTIVE LAYER FOR PROTECTING A SURFACE OF THE PHOTOSENSITIVE LAYER, AND AN INTERMEDIATE LAYER BETWEEN THE PHOTOSENSITIVE LAYER AND THE PROTECTIVE LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-23 | — | — | US | disclosed |
| EP-0490302-A2 | Silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-4956263-A | BLACKAND WHITE PHOTOGRAPHIC FILM CONTAINING CONTAINING A HYDRAZINE DERIVATIVE; HIGH CONTRAST; DAYLIGHT USE; ANTISOILANTS; SAFELIGHT SAFETY | FUJI PHOTO FILM CO., LTD. (JP) | 1990-09-11 | — | — | US | disclosed |
| EP-0306833-A2 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1989-03-15 | — | — | EP | disclosed |
| US-4495276-A | SILVER HALIDE ELEMENT WITH ELECTROCONDUCTIVE METAL OXIDE LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1985-01-22 | — | — | US | disclosed |
| US-4426445-A | AMPHOTERIC SURFACTANTS AS SENSITIZERS | FUJI PHOTO FILM, CO., LTD. (JP) | 1984-01-17 | — | — | US | disclosed |
| US-4374924-A | CATIONIC POLYMERS COMPRISING QUATERNIZED COPOLYMERS OF P-DIVINYLBENZENE OR A DIACRYLIC ESTER AND AN AMINO-CONTAINING ACRYLIC ESTER OR AMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1983-02-22 | — | — | US | disclosed |
| US-4330618-A | Photographic light sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1982-05-18 | — | — | US | disclosed |
| US-4322494-A | SENSITIZERS FOR SILVER HALIDE EMULSIONS; ZWITTERIONS | FUJI PHOTO FILM CO., LTD. (JP) | 1982-03-30 | — | — | US | disclosed |
| US-4251626-A | FOR X-RAY FILMS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4126467-A | POLYMER HAVING REPEATING PIPERAZING-CONTAINING UNITS | FUJI PHOTO FILM CO., LTD. (JP) | 1978-11-21 | — | — | US | disclosed |