Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.42 |
| ▸ | MAPT | P10636 | 8/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.42 |
| ▸ | GAA | P10253 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.41 |
| ▸ | CRHBP | P24387 | 1/20 | 0.41 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.37 |
| ▸ | MEN1 | O00255 | 4/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | ERN1 | O75460 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL17182745 | 0.82 | HSD17B10 (0.50) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| Trifluoromethanesulfonic Acid SCHEMBL29625806 | 0.73 | PTPN1 (0.43) | HSD17B10CYP1A2CYP2C9KDM4EMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL3872598 | 0.73 | PTPN1 (0.43) | HSD17B10CYP1A2CYP2C9KDM4EMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL847347 | 0.73 | GPR3 (0.40) | HPGD | |
| Trifluoromethanesulfonic Acid SCHEMBL31603622 | 0.72 | TDP1 (0.43) | KDM4EALDH1A1HPGDTDP1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL515772 | 0.72 | TDP1 (0.43) | KDM4EALDH1A1HPGDTDP1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL926342 | 0.71 | ALDH1A1 (0.43) | HSD17B10CYP1A2CYP2C9KDM4EMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL31168280 | 0.70 | LDHA (0.37) | HSD17B10MAPTALDH1A1GAAHPGD | |
| Trifluoromethanesulfonic Acid SCHEMBL515598 | 0.70 | LDHA (0.37) | HSD17B10MAPTALDH1A1GAAHPGD | |
| Trifluoromethanesulfonic Acid SCHEMBL12499000 | 0.70 | LMNA (0.38) | ALDH1A1GAATAAR1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-7556908-B2 | Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-07 | — | — | US | disclosed |
| US-7423102-B2 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-09 | — | — | US | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7202010-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7144674-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-12-05 | — | — | US | disclosed |
| US-7129014-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20060160017-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-07-20 | — | — | US | disclosed |
| US-20060073411-A1 | Chemically amplified resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-04-06 | — | — | US | disclosed |
| US-20060014913-A1 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-19 | — | — | US | disclosed |
| US-6689531-B2 | NOVOLAK PHOTORESISTS WITH IMPROVED ADHESION AT THE INTERFACE OF A SUBSTRATE; WET ETCHING, PHOTOSENSITIVITY, RESOLUTION AND HEAT RESISTANCE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20030236351-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITIED (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030219677-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030194639-A1 | Positive resist composition | FORTINET, INC. | 2003-10-16 | — | — | US | disclosed |
| US-20030180659-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-09-25 | — | — | US | disclosed |
| US-20030180663-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY (JP) | 2003-09-25 | — | — | US | disclosed |
| US-20030119957-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-26 | — | — | US | disclosed |
| US-20030114589-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030104312-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-05 | — | — | US | disclosed |
| US-20030099900-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2003-05-29 | — | — | US | disclosed |