Asparagine

Asparagine

SCHEMBL4188697

NC(=O)C[C@@H](N)C(=O)O.NC(=O)C[C@H](N)C(=O)OC(=O)[C@@H](N)CC(N)=O.NCCC(=O)OC(=O)[C@H](N)Cc1ccc(OC(=O)[C@@H](N)CCC(N)=O)cc1.N[C@@H](CO)C(=O)O.O=C(O)[C@@H]1CCCN1

nearest known ligand 0.30

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

SLC5A2

The experimentally established mechanism targets of Asparagine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ITGB3 P05106 1/20 0.30
ITGA2B P08514 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Proline SCHEMBL5503058 0.90 SLC7A5 (0.34) ITGB3ITGA2B
Proline SCHEMBL1675405 0.78 ALOX15 (0.41)
Proline SCHEMBL28237451 0.78 PTPN1 (0.38) ITGB3ITGA2B
Leucine SCHEMBL17065117 0.77 REN (0.33)
Dl-Phenylalanine SCHEMBL10380791 0.77 SLC7A5 (0.47)
Leucine SCHEMBL5151721 0.77 REN (0.34)
Proline SCHEMBL17728309 0.76 SLC7A5 (0.40) ITGB3ITGA2B
Tyrosine SCHEMBL28644593 0.75 SLC7A5 (0.35)
Histidine SCHEMBL8084688 0.74
Tyrosine SCHEMBL28209384 0.74 SLC7A5 (0.41) ITGB3ITGA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7887906-B2 a water-soluble electroconductive polymer containing polythiophenes, polypyrroles, polyanilines, polyfurans with SO3M group and a biosurfactant having a hydrophilic site, produced from a bacteria; excellent in property of preventing film-thinning in chemically amplified resist, and an antistatic film SHOWA DENKO K.K. (JP) 2011-02-15 US disclosed
EP-1779393-B1 ANTISTATIC AGENT, ANTISTATIC FILM AND PRODUCT COATED WITH ANTISTATIC FILM SHOWA DENKO KK (JP) 2009-02-18 EP disclosed
US-20080193730-A1 Antistatic Agent, Antistatic Film and Product Coated with Antistatic Film SHOWA DENKO K.K. (JP) 2008-08-14 US disclosed