SCHEMBL422932

SCHEMBL422932

Nc1ccc[c]c1Oc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.43
LTA4H P09960 4/20 0.42
TSHR P16473 1/20 0.42
CYP3A4 P08684 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
ALOX15 P16050 1/20 0.40
CASP1 P29466 1/20 0.40
CASP7 P55210 1/20 0.40
MAOB P27338 1/20 0.39
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
PARP10 Q53GL7 1/20 0.37
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
NLRP3 Q96P20 1/20 0.36
BCAT2 O15382 1/20 0.36
NR1H2 P55055 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL982444 0.80 LTA4H (0.42) MAOALTA4HTSHRSMN1; SMN2CYP1A2
SCHEMBL434687 0.78 MAOA (0.42) MAOALTA4HTSHRCYP3A4SMN1; SMN2
SCHEMBL983525 0.78 TSHR (0.44) LTA4HTSHRKMT2ANR1H2BAX
SCHEMBL11140990 0.76 LTA4H (0.42) MAOALTA4HTSHRMAOBPARP10
SCHEMBL1929863 0.76 LTA4H (0.42) MAOALTA4HTSHRMAOBPARP10
SCHEMBL7803639 0.76 LTA4H (0.43) MAOALTA4HTSHRCYP3A4SMN1; SMN2
SCHEMBL6036733 0.76 LTA4H (0.42) MAOALTA4HTSHRCYP3A4SMN1; SMN2
SCHEMBL11141243 0.76 LTA4H (0.42) MAOALTA4HTSHRMAOBPARP10
SCHEMBL4932041 0.76 LTA4H (0.42) MAOALTA4HTSHRPARP10NPC1
SCHEMBL5392376 0.74 LTA4H (0.41) MAOALTA4HTSHRSMN1; SMN2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105960682-B Heat conductive electronic substrate and its correlation technique E.I.内穆尔杜邦公司 2019-05-28 CN claimed
CN-109135249-A A method of guaranteeing conductive polyphenyl ether composite materials property 合肥卓汇新材料科技有限公司 2019-01-04 CN claimed
US-20100063310-A1 Functionalized silicon compounds KNEPPER JEFFREY A 2010-03-11 US claimed
EP-1773849-A1 FUNCTIONALIZED SILICON COMPOUNDS Honeywell International, Inc. (US) 2007-04-18 EP claimed
WO-2006014367-A1 FUNCTIONALIZED SILICON COMPOUNDS HONEYWELL INTERNATIONAL INC. (US) 2006-02-09 WO claimed
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP claimed
EP-0646143-B1 MACROMONOMERS HAVING REACTIVE SIDE GROUPS MAXDEM INC (US) 2000-10-18 EP claimed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US claimed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP claimed
US-5869592-A Macromonomers having reactive side groups MAXDEM INCORPORATED (US) 1999-02-09 US claimed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO claimed
EP-0646143-A4 MACROMONOMERS HAVING REACTIVE SIDE GROUPS. MAXDEM INC (US) 1996-07-24 EP claimed
EP-0646143-A1 MACROMONOMERS HAVING REACTIVE SIDE GROUPS MAXDEM INCORPORATED (US) 1995-04-05 EP claimed
WO-1993004098-A1 MACROMONOMERS HAVING REACTIVE SIDE GROUPS MAXDEM INCORPORATED (US) 1993-03-04 WO claimed
CN-117700990-A Resin composition, adhesive, coating agent, cured product, adhesive sheet, resin-coated copper foil, copper-clad laminate, and printed wiring board 荒川化学工业株式会社 2024-03-15 CN disclosed
CN-115877658-A Curable photosensitive resin composition, cured product, resist pattern and method for producing same, semiconductor element, and electronic device 荒川化学工业株式会社 2023-03-31 CN disclosed
US-20230101181-A1 CURABLE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, RESIST PATTERN, METHOD OF PRODUCING RESIST PATTERN, SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2023-03-30 US disclosed
EP-0599886-A1 MACROMONOMERS HAVING REACTIVE END GROUPS MAXDEM INCORPORATED (US) 1994-06-08 EP disclosed
WO-1993004099-A1 MACROMONOMERS HAVING REACTIVE END GROUPS MAXDEM INCORPORATED (US) 1993-03-04 WO disclosed
WO-1993004098-A1 MACROMONOMERS HAVING REACTIVE SIDE GROUPS MAXDEM INCORPORATED (US) 1993-03-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100063310-A1 Functionalized silicon compounds SIK1, MSN, SIK2 MAOA 1356/4885LTA4H 1813/4885TSHR 4144/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.