Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1054644 | 0.91 | ACHE (0.43) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL29973455 | 0.91 | ACHE (0.43) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL31329266 | 0.91 | ACHE (0.43) | ACHELMNATSHRALOX12TDP1 | |
| Toliodium SCHEMBL125171 | 0.88 | ACHE (0.57) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL17200747 | 0.87 | ACHE (0.40) | ACHELMNATSHRALOX12TDP1 | |
| Toliodium SCHEMBL3284569 | 0.85 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| Toliodium SCHEMBL5408779 | 0.85 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| Toliodium SCHEMBL9296014 | 0.85 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| Toliodium SCHEMBL7743288 | 0.85 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL12762155 | 0.85 | ALDH1A1 (0.38) | ACHELMNATSHRALOX12TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 371 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6498200-B1 | OXIRANE OR OXETANE RING COMPOUND, ORGANIC PEROXIDE, ONIUM SALT CATALYST, AND ALKALINE FILLER; CURES RAPIDLY; STABLE DOES NOT CAUSE INCREASE IN ELECTROCONDUCTIVITY OR CORROSION; SEALANT, BINDER, ENCAPSULATING AGENT, DIELECTRIC FILM | NAMICS CORPORATION (JP) | 2002-12-24 | — | — | US | claimed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11883510-B2 | Dental composition comprising a particulate carrier supporting a coinitiator | DENTSPLY SIRONA INC. (US) | 2024-01-30 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| US-11844848-B2 | Photocurable dental composition | DENTSPLY SIRONA INC. (US) | 2023-12-19 | — | — | US | disclosed |
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-4607116-A | FROM DIARYLIODONIUM SALT | NIPPON PETROCHEMICALS COMPANY LIMITED (JP) | 1986-08-19 | — | — | US | disclosed |
| EP-0119065-B1 | PROCESS FOR PREPARING DIARYLS | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1986-08-13 | — | — | EP | disclosed |
| US-4590281-A | REACTING DIARYLIODONIUM SALT WITH UNSATURATED ALCOHOL | NIPPON PETROCHEMICALS COMPANY (JP) | 1986-05-20 | — | — | US | disclosed |
| EP-0061898-B1 | VISIBLE LIGHT SENSITIVE, THERMALLY DEVELOPABLE IMAGING SYSTEMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-19 | — | — | EP | disclosed |
| EP-0119068-A1 | Method for preparing diaryl iodonium salts | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1984-09-19 | — | — | EP | disclosed |
| EP-0119065-A1 | Process for preparing diaryls | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1984-09-19 | — | — | EP | disclosed |
| EP-0119067-A1 | Process for preparing aldehydes | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1984-09-19 | — | — | EP | disclosed |
| US-4460677-A | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4386154-A | ACYLATED LEUCO DYES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-05-31 | — | — | US | disclosed |
| EP-0061898-A1 | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-10-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11844848-B2 | Photocurable dental composition | TST, SULT1A1, SULT2A1 | ACHE 3573/4885LMNA 3664/4885TSHR 4613/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | ACHE 4873/4885LMNA 1159/4885TSHR 2364/4885 |
| US-11883510-B2 | Dental composition comprising a particulate carrier supporting a coinitiator | PICALM, PDS5B, CLTA | ACHE 3568/4885LMNA 3551/4885TSHR 2840/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.