Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.41 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.41 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.41 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.41 |
| ▸ | KDM1A | O60341 | 2/20 | 0.40 |
| ▸ | MAOA | P21397 | 2/20 | 0.40 |
| ▸ | MAOB | P27338 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11777482 | 0.97 | TSHR (0.50) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Iodide SCHEMBL7898647 | 0.97 | TSHR (0.50) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL5421594 | 0.91 | CYP1A2 (0.48) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL147327 | 0.88 | LMNA (0.57) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Bromide SCHEMBL11745160 | 0.85 | LMNA (0.53) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Iodide SCHEMBL29644490 | 0.85 | LMNA (0.53) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Hydrochloric Acid SCHEMBL1717049 | 0.85 | LMNA (0.53) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL12762155 | 0.85 | ALDH1A1 (0.38) | TSHRCYP1A2LMNACYP2A6KDM1A | |
| SCHEMBL36560 | 0.82 | ALDH1A1 (0.40) | TSHRCYP1A2LMNACYP2A6KDM1A | |
| Fluoride SCHEMBL4074823 | 0.80 | LMNA (0.47) | TSHRCYP1A2LMNACYP2A6CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 162 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-11-26 | — | — | US | disclosed |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-09-17 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| EP-0302610-A2 | Light sensitive element | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-02-08 | — | — | EP | disclosed |
| EP-0061898-B1 | VISIBLE LIGHT SENSITIVE, THERMALLY DEVELOPABLE IMAGING SYSTEMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-19 | — | — | EP | disclosed |
| US-4460677-A | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4386154-A | ACYLATED LEUCO DYES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-05-31 | — | — | US | disclosed |
| EP-0061898-A1 | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-10-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | TSHR 941/4885CYP1A2 3868/4885LMNA 2641/4885 |
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | ABCC1, CBR1, ARSA | TSHR 2103/4885CYP1A2 852/4885LMNA 2657/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | TSHR 2364/4885CYP1A2 4438/4885LMNA 1159/4885 |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | POLM, CBR1, PFAS | TSHR 2995/4885CYP1A2 1117/4885LMNA 578/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.