Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.65 |
| ▸ | MAPT | P10636 | 6/20 | 0.62 |
| ▸ | LMNA | P02545 | 3/20 | 0.62 |
| ▸ | TP53 | P04637 | 2/20 | 0.62 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.62 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.62 |
| ▸ | HTT | P42858 | 1/20 | 0.62 |
| ▸ | RAB9A | P51151 | 3/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.59 |
| ▸ | NPC1 | O15118 | 1/20 | 0.59 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.59 |
| ▸ | APAF1 | O14727 | 1/20 | 0.57 |
| ▸ | POLB | P06746 | 1/20 | 0.57 |
| ▸ | TDO2 | P48775 | 2/20 | 0.55 |
| ▸ | SLC9A1 | P19634 | 3/20 | 0.54 |
| ▸ | USP2 | O75604 | 1/20 | 0.54 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL972935 | 0.84 | APAF1 (0.62) | ALDH1A1MAPTLMNATP53TDP1 | |
| SCHEMBL7560053 | 0.83 | ALDH1A1 (0.60) | ALDH1A1MAPTLMNATP53TDP1 | |
| SCHEMBL9772257 | 0.81 | APAF1 (0.59) | ALDH1A1MAPTLMNATP53TDP1 | |
| SCHEMBL11442537 | 0.81 | APAF1 (0.68) | ALDH1A1MAPTLMNATP53TDP1 | |
| SCHEMBL4233526 | 0.78 | MAPT (0.55) | ALDH1A1MAPTLMNATP53TDP1 | |
| SCHEMBL260406 | 0.78 | SLC9A1 (0.66) | MAPTTDP1RAB9ANPC1APAF1 | |
| SCHEMBL7716431 | 0.77 | APAF1 (0.67) | ALDH1A1MAPTLMNATP53TDP1 | |
| Fluoride SCHEMBL31379726 | 0.77 | SLC9A1 (0.63) | MAPTTDP1RAB9ANPC1POLB | |
| Phosphine SCHEMBL28183639 | 0.77 | SLC9A1 (0.63) | MAPTTDP1RAB9ANPC1APAF1 | |
| SCHEMBL21304645 | 0.77 | APAF1 (0.75) | ALDH1A1MAPTTP53RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 568 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114016031-B | Quick etching liquid and preparation method thereof | 深圳市松柏实业发展有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-114016031-A | Fast etching liquid and preparation method thereof | 深圳市松柏实业发展有限公司 | 2022-02-08 | — | — | CN | claimed |
| CN-107406752-B | Polishing agent, stock solution for polishing agent, and polishing method | 日立化成株式会社 | 2020-05-08 | — | — | CN | claimed |
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | claimed |
| CN-102318042-B | Polishing agent for polishing copper and polishing method using same | HITACHI CHEMICAL CO LTD | 2015-07-01 | — | — | CN | claimed |
| US-8864860-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2014-10-21 | — | — | US | claimed |
| US-8697345-B2 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-04-15 | — | — | US | claimed |
| US-20100190112-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA | 2010-07-29 | — | — | US | claimed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | claimed |
| US-20070128872-A1 | Polishing composition and polishing method | SHOWA DENKO K.K. (JP) | 2007-06-07 | — | — | US | claimed |
| US-20070004933-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA | 2007-01-04 | — | — | US | claimed |
| EP-1687387-A1 | POLISHING COMPOSITION COMPRISING PHOSPHATE ESTERS AND POLISHING METHOD | Showa Denko K.K. (JP) | 2006-08-09 | — | — | EP | claimed |
| US-20060063688-A1 | Photoresist stripping solution and method of treating substrate with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-03-23 | — | — | US | claimed |
| US-20060014110-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA | 2006-01-19 | — | — | US | claimed |
| CN-1235093-C | Corrosion inhibitor stripper composition using conductive material with high equivalent electric conductivity in aqueous bolution | DUCKSUNG CO LTD (KR) | 2006-01-04 | — | — | CN | claimed |
| WO-2005047409-A1 | POLISHING COMPOSITION AND POLISHING METHOD | SHOWA DENKO K.K. (JP) | 2005-05-26 | — | — | WO | claimed |
| US-20050019688-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA (JP) | 2005-01-27 | — | — | US | claimed |
| US-20030199407-A1 | Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution | DUKSUNG CO., LTD. (KR) | 2003-10-23 | — | — | US | claimed |
| US-20030138737-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-07-24 | — | — | US | claimed |
| EP-1281787-A2 | Additives for accelerator solution for electroless metal plating | Shipley Co. L.L.C. (US) | 2003-02-05 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070004933-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | ALKBH2, AS3MT, KDM2B | ALDH1A1 2929/4885MAPT 584/4885LMNA 2367/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.