Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | GABRP | O00591 | 2/20 | 0.31 |
| ▸ | GABRD | O14764 | 2/20 | 0.31 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.31 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.31 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.31 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.31 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.31 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.31 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.31 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.31 |
| ▸ | GABRA4 | P48169 | 2/20 | 0.31 |
| ▸ | GABRE | P78334 | 2/20 | 0.31 |
| ▸ | GABRA6 | Q16445 | 2/20 | 0.31 |
| ▸ | GABRG1 | Q8N1C3 | 2/20 | 0.31 |
| ▸ | GABRG3 | Q99928 | 2/20 | 0.31 |
| ▸ | GABRQ | Q9UN88 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9609346 | 0.97 | ALOX15 (0.36) | ALOX15ALDH1A1GAAMAPTGABRP | |
| SCHEMBL13088230 | 0.86 | ALDH1A1 (0.32) | ALDH1A1GAAMAPT | |
| SCHEMBL10040357 | 0.85 | ALDH1A1 (0.30) | ALDH1A1GAAMAPT | |
| SCHEMBL13115997 | 0.83 | ALOX15 (0.34) | ALOX15GABRPGABRDGABRA1GABRB1 | |
| SCHEMBL74951 | 0.82 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL19881129 | 0.82 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL23382977 | 0.81 | ALDH1A1 (0.34) | ALDH1A1GAAMAPT | |
| SCHEMBL14271591 | 0.81 | ALOX15 (0.33) | ALOX15 | |
| SCHEMBL19273245 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL20959815 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20110245395-A1 | Top Coat Composition | CENTRAL GLASS COMPANY, LIMITED | 2011-10-06 | — | — | US | disclosed |
| US-20110245395-A1 | Top Coat Composition | CENTRAL GLASS COMPANY, LIMITED | 2011-10-06 | — | — | US | disclosed |
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | Central Glass Company , Limited (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | Central Glass Company , Limited (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | AFF1, FRG1, AFF2 | ALOX15 4213/4885ALDH1A1 2056/4885GAA 4855/4885 |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | ADH1A, ADH1C, ADH5 | ALOX15 443/4885ALDH1A1 4/4885GAA 2314/4885 |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | FRG1, AFF2, FBXL19 | ALOX15 4365/4885ALDH1A1 4430/4885GAA 4562/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.