SCHEMBL439930

SCHEMBL439930

CC(O)(C1=C(C(O)(C(F)(F)F)C(F)(F)F)C2C=CC1C2)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.30
NR1H3 Q13133 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10151912 0.88 NR1H2 (0.30) NR1H2NR1H3
SCHEMBL15096061 0.87 NR1H2 (0.33) NR1H2NR1H3
SCHEMBL10005788 0.87
SCHEMBL439936 0.72 HSD11B1 (0.33)
SCHEMBL1012075 0.65
SCHEMBL15096063 0.62 NR1H2 (0.33) NR1H2NR1H3
SCHEMBL13225790 0.60
SCHEMBL10079685 0.60 NR1H2 (0.31) NR1H2NR1H3
SCHEMBL10165226 0.56 HSD11B1 (0.59) NR1H2NR1H3
SCHEMBL17286727 0.56 ALOX15 (0.43) NR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9678426-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9678425-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-20140221589-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation CENTRAL GLASS COMPANY, LIMITED (JP) 2014-08-07 US disclosed
US-20140220490-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation CENTRAL GLASS COMPANY, LIMITED (JP) 2014-08-07 US disclosed
US-8663903-B2 Top coating composition CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
US-20130209938-A1 Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same CENTRAL GLASS COMPANY, LTD. (JP) 2013-08-15 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20120040294-A1 Top Coating Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2012-02-16 US disclosed
US-20110245395-A1 Top Coat Composition CENTRAL GLASS COMPANY, LIMITED 2011-10-06 US disclosed
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Central Glass Company , Limited (JP) 2011-10-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation AFF1, FRG1, AFF2 NR1H2 2712/4885NR1H3 2354/4885
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer ADH1A, ADH1C, ADH5 NR1H2 2409/4885NR1H3 2117/4885
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method FRG1, AFF2, FBXL19 NR1H2 569/4885NR1H3 351/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.