Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDC25B | P30305 | 3/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | AKT1 | P31749 | 1/20 | 0.38 |
| ▸ | SNCA | P37840 | 1/20 | 0.38 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.38 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.38 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.38 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.38 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | BCHE | P06276 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PTPRC | P08575 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2452850 | 0.90 | IDO1 (0.41) | CDC25BIDO1MAOAMAOBAKT1 | |
| SCHEMBL4818463 | 0.78 | CDC25B (0.34) | CDC25BIDO1KDM4EMEN1ALDH1A1 | |
| SCHEMBL126239 | 0.78 | CDC25B (0.33) | CDC25BIDO1MAOAMAOBAKT1 | |
| SCHEMBL8936319 | 0.77 | GPR84 (0.33) | CES1 | |
| SCHEMBL26205058 | 0.77 | NQO1 (0.31) | — | |
| SCHEMBL4076256 | 0.73 | IDO1 (0.35) | CDC25BIDO1MAOAMAOBAKT1 | |
| SCHEMBL8321788 | 0.70 | — | — | |
| SCHEMBL3444764 | 0.70 | MEN1 (0.48) | CDC25BIDO1MAOAKDM4EMEN1 | |
| SCHEMBL10533241 | 0.70 | — | — | |
| SCHEMBL49498 | 0.68 | PTPRC (0.39) | CDC25BIDO1MAOAMAOBAKT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8835697-B2 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8795955-B2 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20120252218-A1 | BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20110311920-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2011-12-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120252218-A1 | BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | BMI1, AR, AXIN2 | CDC25B 3399/4885IDO1 1421/4885MAOA 2673/4885 |
| US-20110311920-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SMC1A, VCAM1, APOB | CDC25B 3384/4885IDO1 3472/4885MAOA 3202/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.