Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14877467 | 0.89 | — | — | |
| SCHEMBL686101 | 0.89 | SMN1; SMN2 (0.31) | SMN1; SMN2 | |
| SCHEMBL785964 | 0.87 | FKBP1A (0.30) | SMN1; SMN2 | |
| SCHEMBL10061831 | 0.84 | ALOX15 (0.35) | SMN1; SMN2 | |
| SCHEMBL12510375 | 0.83 | — | — | |
| SCHEMBL12135520 | 0.83 | — | — | |
| SCHEMBL12430040 | 0.82 | FKBP1A (0.30) | — | |
| SCHEMBL13370889 | 0.82 | — | — | |
| SCHEMBL879056 | 0.82 | — | — | |
| SCHEMBL12993906 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8791293-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8791293-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-7906269-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| WO-2010140483-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD | セントラル硝子株式会社 (JP) | 2010-12-09 | — | — | WO | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | SMN1; SMN2 1372/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | SMN1; SMN2 2820/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.