SCHEMBL446183

SCHEMBL446183

CCCCOC(=O)C(C)OC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
ATM Q13315 1/20 0.48
TSHR P16473 5/20 0.45
HPGD P15428 2/20 0.45
HCAR2 Q8TDS4 1/20 0.42
NAAA Q02083 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
NPSR1 Q6W5P4 2/20 0.40
MAPT P10636 1/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
EPHX1 P07099 1/20 0.39
LMNA P02545 1/20 0.39
ESR1 P03372 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6938703 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL195164 0.86 HCAR2 (0.39) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL13715542 0.83 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL445760 0.83 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL6370067 0.83 ACHE (0.34) ALDH1A1ATMACHE
SCHEMBL14511572 0.83 ALDH1A1 (0.32) ALDH1A1ATM
SCHEMBL448441 0.81 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL3038430 0.81 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL10853523 0.81 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL12150098 0.81 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 524 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106610567-A Method for producing layer structure, and method for forming patterns 三星SDI株式会社 2017-05-03 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
EP-4706796-A1 ANTIFOAMING AGENT, LUBRICATING OIL COMPOSITION CONTAINING ANTIFOAMING AGENT, AND MACHINE USING LUBRICATING OIL COMPOSITION DIC Corporation (JP) 2026-03-11 EP disclosed
EP-4692146-A1 LEVELING AGENT, RESIST COMPOSITION, AND POLARIZING PLATE DIC Corporation (JP) 2026-02-11 EP disclosed
EP-4692141-A1 COPOLYMER AND COATING COMPOSITION OR RESIST COMPOSITION CONTAINING COPOLYMER DIC Corporation (JP) 2026-02-11 EP disclosed
US-20260016621-A1 SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND SILICONE-CONTAINING COPOLYMER PRODUCTION METHOD DIC CORPORATION (JP) 2026-01-15 US disclosed
EP-4620986-A1 RANDOM COPOLYMER, COATING COMPOSITION AND RESIST COMPOSITION CONTAINING SAID COPOLYMER DIC Corporation (JP) 2025-09-24 EP disclosed
EP-4268920-B1 ANTIFOAMING AGENT, LUBRICATING OIL COMPOSITION CONTAINING ANTIFOAMING AGENT, AND MACHINE USING LUBRICATING OIL COMPOSITION DAINIPPON INK & CHEMICALS (JP) 2025-09-17 EP disclosed
EP-4617773-A1 RESIST COMPOSITION AND CURED PRODUCT OF SAME DIC Corporation (JP) 2025-09-17 EP disclosed
US-20250188226-A1 COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, AND ARTICLE DIC CORPORATION (JP) 2025-06-12 US disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
US-6313244-B1 USED IN COATING PAINTS OR LAMINATES WITH UNIFORMITY AND SURFACE SMOOTHNESS BY A SPRAY COATING, AND IN FIELD OF COATING THIN COAT OF PHOTO-RESIST CONTAINING A PHOTO-SENSITIZER BY A SPIN-COATING FOR THE PRODUCTION OF DAINIPPON INK AND CHEMICALS, INC. (JP) 2001-11-06 US disclosed
US-6313233-B1 CAN BE CURED AND FABRICATED WITHOUT PRODUCING NO CRACKS INTO A CURED PRODUCT SUCH AS A SEMICONDUCTOR DEVICE HAVING A LOW DIELECTRIC CONSTANT, HIGH HEAT RESISTANCE AND MOISTURE RESISTANCE, SUPERIOR ADHESION TO VARIOUS SUBSTRATE MATERIALS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-06 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
US-6156860-A Surface active agent containing fluorine and coating compositions using the same DAINIPPON INK AND CHEMICALS, INC. (JP) 2000-12-05 US disclosed
US-6011123-A ORGANOSILANE COMPOUND; POLYAMIC ACIDS HAVING A HYDROLYZABLE SILYL GROUP OR CARBOXYLIC ACID ANHYDRIDE GROUP, OR BOTH, AND POLYIMIDES HAVING A HYDROLYZABLE SILYL GROUP OR CARBOXYLIC ACID ANHYDRIDE GROUP, OR BOTH. JSR CORPORATION (JP) 2000-01-04 US disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0844283-A1 Curable resin composition and cured products JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-05-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 ALDH1A1 209/4885ATM 502/4885TSHR 3217/4885
US-20260016621-A1 SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND SILICONE-CONTAINING COPOLYMER PRODUCTION METHOD MSR1, STRA6, TGFBR1 ALDH1A1 2408/4885ATM 1035/4885TSHR 425/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.