SCHEMBL4474368

SCHEMBL4474368

NC(=O)C1C2CC(C3OC23)C1C(=O)NOS(=O)(=O)c1ccccc1C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CTSS P25774 4/20 0.35
KMT2A Q03164 3/20 0.34
MEN1 O00255 2/20 0.34
ALDH1A1 P00352 2/20 0.34
HCRTR1 O43613 1/20 0.33
GAA P10253 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
F2 P00734 1/20 0.33
SSTR4 P31391 1/20 0.33
KAT6A Q92794 1/20 0.33
SLC22A12 Q96S37 1/20 0.33
HSD11B1 P28845 1/20 0.33
SCN9A Q15858 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5999663 0.89 KAT6A (0.36) CTSSKMT2AMEN1ALDH1A1HCRTR1
SCHEMBL4090243 0.82 ALDH1A1 (0.48) CTSSKMT2AMEN1ALDH1A1HCRTR1
SCHEMBL5472080 0.82 ALDH1A1 (0.36) CTSSKMT2AMEN1ALDH1A1HCRTR1
SCHEMBL4334243 0.68 KMT2A (0.43) CTSSKMT2AMEN1ALDH1A1F2
SCHEMBL28266652 0.62 MEN1 (0.51) KMT2AMEN1ALDH1A1GAATDP1
SCHEMBL6918643 0.62 ENPP3 (0.41) ALDH1A1GAATDP1
SCHEMBL451960 0.61 KMT2A (0.46) KMT2AMEN1ALDH1A1KAT6ASLC22A12
SCHEMBL29624178 0.60 KMT2A (0.56) KMT2AMEN1ALDH1A1GAATDP1
SCHEMBL247640 0.60 KMT2A (0.56) KMT2AMEN1ALDH1A1GAATDP1
SCHEMBL13290746 0.59 KMT2A (0.51) KMT2AMEN1ALDH1A1GAASLC22A12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090288855-A1 POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A METAL-PLATING FORMED MATERIAL, TRANSCRIPTION FILM AND PRODUCTION METHOD OF A METAL-PLATING FORMED MATERIAL JSR CORPORATION (JP) 2009-11-26 US disclosed
US-20070031758-A1 Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORPORATION (JP) 2007-02-08 US disclosed
EP-1750176-A2 Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR Corporation (JP) 2007-02-07 EP disclosed