Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.60 |
| ▸ | USP2 | O75604 | 1/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | MAPT | P10636 | 3/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | HPGD | P15428 | 1/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.57 |
| ▸ | HTR7 | P34969 | 5/20 | 0.56 |
| ▸ | PDE10A | Q9Y233 | 2/20 | 0.53 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL449634 | 0.87 | ALDH1A1 (0.64) | SMN1; SMN2ALDH1A1GAAHTR7PDE10A | |
| SCHEMBL451191 | 0.85 | ALDH1A1 (0.64) | SMN1; SMN2ALDH1A1LMNAGAAHTR7 | |
| SCHEMBL450020 | 0.85 | HTR7 (0.61) | SMN1; SMN2USP2ALDH1A1GAAHTR7 | |
| SCHEMBL1552965 | 0.85 | PDE10A (0.62) | SMN1; SMN2ALDH1A1GAAHTR7PDE10A | |
| SCHEMBL449655 | 0.84 | POLB (0.61) | SMN1; SMN2ALDH1A1GAAHTR7PDE10A | |
| SCHEMBL447996 | 0.83 | HTR7 (0.59) | SMN1; SMN2ALDH1A1MAPTGAAHTR7 | |
| SCHEMBL452387 | 0.82 | HTR7 (0.59) | SMN1; SMN2ALDH1A1GAAHTR7PDE10A | |
| SCHEMBL454025 | 0.81 | ALDH1A1 (0.60) | SMN1; SMN2ALDH1A1MAPTKDM4ELMNA | |
| SCHEMBL448566 | 0.78 | ALDH1A1 (0.56) | SMN1; SMN2USP2ALDH1A1MAPTKDM4E | |
| SCHEMBL452084 | 0.77 | PDE10A (0.60) | ALDH1A1MAPTLMNAGAAHTR7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10233274-B2 | Curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-2760894-B1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-9957340-B2 | Imprinting method and curable composition for imprinting | CANON KABUSHIKI KAISHA (JP) | 2018-05-01 | — | — | US | disclosed |
| US-9961776-B2 | Method of producing cured product and method of forming pattern | CANON KABUSHIKI KAISHA (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180039170-A1 | NANONIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING NANOIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING CURED PRODUCT PATTERN, METHOD FOR MANUFACTURING OPTICAL COMPONENT, AND METHOD FOR MANUFACTURING CIRCUIT BOARD | CANON KABUSHIKI KAISHA (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20170278704-A1 | PHOTOCURABLE COMPOSITION, METHOD FOR FORMING A PATTERN, AND METHOD FOR PRODUCING A PHOTOCURED PRODUCT | CANON KK (JP) | 2017-09-28 | — | — | US | disclosed |
| WO-2013183467-A1 | CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KABUSHIKI KAISHA (JP) | 2013-12-12 | — | — | WO | disclosed |
| US-20120164395-A1 | MANUFACTURING METHOD FOR PLASTIC MEMBER AND PLASTIC MEMBER | CANON KABUSHIKI KAISHA (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120061864-A1 | METHOD FOR MANUFACTURING LENS, APPARATUS FOR MANUFACTURING LENS, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2012-03-15 | — | — | US | disclosed |
| EP-2372405-A1 | Lens and method for producing lens | Canon Kabushiki Kaisha (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-20070275327-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20050221222-A1 | Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method | CANON KABUSHIKI KAISHA (JP) | 2005-10-06 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6824954-B2 | DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | SMN1; SMN2 1241/4885USP2 1208/4885ALDH1A1 1216/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.