Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4544316 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47306 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL28137753 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL133202 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL686077 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47303 | 0.98 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL27927215 | 0.94 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL673334 | 0.90 | ALDH1A1 (0.39) | ALDH1A1THRBTSHR | |
| Acrylic Acid SCHEMBL31420446 | 0.89 | LMNA (0.31) | ALDH1A1THRBTSHR | |
| SCHEMBL21338913 | 0.87 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109429511-A | Positive photoresist composition, photoresist pattern using the same, and method for manufacturing photoresist pattern | 株式会社LG化学 | 2019-03-05 | — | — | CN | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| WO-2004041770-A1 | CHEMICALLY AMPLIFIED POLYMER HAVING PENDANT GROUP WITH CYCLODODECYL AND RESIST COMPOSITION COMPRISING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-05-21 | — | — | WO | disclosed |