Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4544316 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47306 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL4544299 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL28137753 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL686077 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47303 | 0.98 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL27927215 | 0.94 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL673334 | 0.90 | ALDH1A1 (0.39) | ALDH1A1THRBTSHR | |
| Acrylic Acid SCHEMBL31420446 | 0.89 | LMNA (0.31) | ALDH1A1THRBTSHR | |
| SCHEMBL21338913 | 0.87 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1653 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4733840-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, AND RESIN SHEET | Resonac Corporation (JP) | 2026-04-29 | — | — | EP | claimed |
| CN-116102747-B | Preparation method of donor microspheres for homogeneous chemiluminescence analysis | 东南大学 | 2025-03-21 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| WO-2025004836-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, AND RESIN SHEET | 株式会社レゾナック | 2025-01-02 | — | — | WO | claimed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118853024-A | High-nickel ternary positive electrode binder and preparation method and application thereof | 深圳大学 | 2024-10-29 | — | — | CN | claimed |
| CN-118108890-B | G-line and h-line light absorption resin and preparation method thereof | 广东粤港澳大湾区黄埔材料研究院 | 2024-07-02 | — | — | CN | claimed |
| CN-118108890-A | G-line and h-line light absorption resin and preparation method thereof | 广东粤港澳大湾区黄埔材料研究院 | 2024-05-31 | — | — | CN | claimed |
| CN-117866538-A | Flexible display device packaged by thin film | 武汉尚赛光电科技有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-115536776-B | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-116102747-A | Preparation method of donor microspheres for homogeneous chemiluminescence analysis | 东南大学 | 2023-05-12 | — | — | CN | claimed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-04-20 | — | — | CN | claimed |
| US-10133096-B2 | Array substrate, display panel, display apparatus, and method for producing array substrate | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2018-11-20 | — | — | US | claimed |
| US-8916330-B2 | Chemically amplified photoresist composition and method for forming resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-23 | — | — | US | claimed |
| US-8883394-B2 | — | — | 2014-11-11 | — | — | US | claimed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | claimed |
| US-12637406-B2 | Diester structure monomer, preparation method therefor, and application thereof | Ningbo Nata Opto-electronic Material Co., Ltd. (CN) | 2026-05-26 | — | — | US | disclosed |
| WO-1982000147-A1 | HYDROPHILIC INTERPOLYMERS OF ACRYLIC ACID AND AN ACRYLATE | GOODRICH CO B F (US) | 1982-01-21 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637406-B2 | Diester structure monomer, preparation method therefor, and application thereof | CDH1, SMCHD1, CAD | ALDH1A1 1367/4885THRB 1672/4885TSHR 1110/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.