Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL133202 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47306 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL4544299 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL686077 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL4544316 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL28137753 | 0.98 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL27927215 | 0.96 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL673334 | 0.92 | ALDH1A1 (0.39) | ALDH1A1THRBTSHR | |
| Acrylic Acid SCHEMBL31420446 | 0.90 | LMNA (0.31) | ALDH1A1THRBTSHR | |
| SCHEMBL21332849 | 0.86 | ALDH1A1 (0.38) | ALDH1A1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2496 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798524-A | Resin for immersion type ArF photoresist, preparation method and immersion type ArF photoresist | 宁波南大光电材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119798525-A | Resin for immersion photoresist, preparation method and immersion photoresist | 宁波南大光电材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-119285842-A | Fluorine-containing polymer, preparation method thereof and ArF immersed photoresist prepared from fluorine-containing polymer | 瑞红(苏州)电子化学品股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118853024-A | High-nickel ternary positive electrode binder and preparation method and application thereof | 深圳大学 | 2024-10-29 | — | — | CN | claimed |
| CN-118625599-A | Photosensitive resin composition, photosensitive dry film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2024-09-10 | — | — | CN | claimed |
| CN-118108890-B | G-line and h-line light absorption resin and preparation method thereof | 广东粤港澳大湾区黄埔材料研究院 | 2024-07-02 | — | — | CN | claimed |
| CN-118108890-A | G-line and h-line light absorption resin and preparation method thereof | 广东粤港澳大湾区黄埔材料研究院 | 2024-05-31 | — | — | CN | claimed |
| CN-104672410-B | Self-assembled structures, methods of making the same, and articles comprising the same | 得克萨斯A&M大学系统 | 2017-08-08 | — | — | CN | claimed |
| US-9405189-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-08-02 | — | — | US | claimed |
| CN-104672410-A | Self-assembled structures, methods of making the same, and articles comprising the same | ROHM & HAAS ELECT MAT | 2015-06-03 | — | — | CN | claimed |
| CN-104678699-A | Self-assembled structures, methods of making the same, and articles comprising the same | ROHM & HAAS ELECT MAT | 2015-06-03 | — | — | CN | claimed |
| US-20150072291-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-03-12 | — | — | US | claimed |
| US-20150072292-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | THE TEXAS A&M UNIVERSITY SYSTEM | 2015-03-12 | — | — | US | claimed |
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | claimed |
| US-20130344441-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-26 | — | — | US | claimed |
| CN-101256355-B | Composition for immersion lithography and immersion lithography method | ROHM & HAAS ELECT MAT | 2013-03-27 | — | — | CN | claimed |
| US-20120115085-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | claimed |